PLZT陶瓷的光致伸缩与样品厚度和表面粗糙度的关系

1997 IEEE Ultrasonics Symposium Proceedings. An International Symposium (Cat. No.97CH36118) Pub Date : 1997-10-05 DOI:10.1109/ULTSYM.1997.663082

P. Poosanaas, A. Dogan, S. Thakoor, K. Uchino

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引用次数: 3

摘要

具有高光电性能的铁电材料是光致伸缩陶瓷作动器等新型光学器件的研究热点。为了追求这些高性能的光致伸缩材料，本研究考察了样品厚度和表面粗糙度对掺杂WO/ sub3 / PLZT陶瓷光致伸缩的影响。提出了具有最大光致伸缩响应的最佳试样厚度的计算模型。该模型与实验结果吻合较好，为光致伸缩器件的设计提供了理论依据。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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Dependence of photostriction on sample thickness and surface roughness for PLZT ceramics

The ferroelectric materials with high photovoltaic properties are of interest for the new optical devices such as photostrictive ceramic actuators. In pursuit of these high performance photostrictive materials, the present research examines the influence of sample thickness and surface roughness on photostriction of WO/sub 3/ doped PLZT ceramics. A model for the calculation of optimum sample thickness having maximum photostrictive response is proposed. This model agrees well with the experimental results, and it will help in designing the photostrictive devices.

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1997 IEEE Ultrasonics Symposium Proceedings. An International Symposium (Cat. No.97CH36118)

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