{"title":"未更新和连续机械更新的铜电极表面在塔菲尔电位区域的铜沉积过电压","authors":"C.I. Noninski, L.P. Veleva, V.C. Noninski","doi":"10.1016/0376-4583(85)90025-1","DOIUrl":null,"url":null,"abstract":"<div><p>The copper deposition overvoltage in the Tafel potential region on both non-renewed and continuously mechanically renewed working electrode surfaces in H<sub>2</sub>SO<sub>4</sub>-CuSO<sub>4</sub> solutions of various compositions (0.06 - 0.75 M CuSO<sub>4</sub> + 2 M H<sub>2</sub>SO<sub>4</sub>) was studied using a copper self-cleaning rotating electrode. A decrease in the overvoltage on the continuously mechanically renewed electrode surface was observed in the Tafel region for all solution compositions investigated.</p></div>","PeriodicalId":22037,"journal":{"name":"Surface Technology","volume":"25 2","pages":"Pages 127-133"},"PeriodicalIF":0.0000,"publicationDate":"1985-06-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1016/0376-4583(85)90025-1","citationCount":"2","resultStr":"{\"title\":\"Copper deposition overvoltage on non-renewed and continuously mechanically renewed copper electrode surfaces in the Tafel potential region\",\"authors\":\"C.I. Noninski, L.P. Veleva, V.C. Noninski\",\"doi\":\"10.1016/0376-4583(85)90025-1\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"<div><p>The copper deposition overvoltage in the Tafel potential region on both non-renewed and continuously mechanically renewed working electrode surfaces in H<sub>2</sub>SO<sub>4</sub>-CuSO<sub>4</sub> solutions of various compositions (0.06 - 0.75 M CuSO<sub>4</sub> + 2 M H<sub>2</sub>SO<sub>4</sub>) was studied using a copper self-cleaning rotating electrode. A decrease in the overvoltage on the continuously mechanically renewed electrode surface was observed in the Tafel region for all solution compositions investigated.</p></div>\",\"PeriodicalId\":22037,\"journal\":{\"name\":\"Surface Technology\",\"volume\":\"25 2\",\"pages\":\"Pages 127-133\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1985-06-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"https://sci-hub-pdf.com/10.1016/0376-4583(85)90025-1\",\"citationCount\":\"2\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Surface Technology\",\"FirstCategoryId\":\"1087\",\"ListUrlMain\":\"https://www.sciencedirect.com/science/article/pii/0376458385900251\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Surface Technology","FirstCategoryId":"1087","ListUrlMain":"https://www.sciencedirect.com/science/article/pii/0376458385900251","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 2
摘要
采用铜自清洁旋转电极，研究了不同组分(0.06 ~ 0.75 M CuSO4 + 2 M H2SO4)的H2SO4-CuSO4溶液中未更新和连续机械更新的工作电极表面的Tafel电位区铜沉积过电压。在研究的所有溶液组成中，在Tafel区观察到连续机械更新电极表面过电压的降低。
Copper deposition overvoltage on non-renewed and continuously mechanically renewed copper electrode surfaces in the Tafel potential region
The copper deposition overvoltage in the Tafel potential region on both non-renewed and continuously mechanically renewed working electrode surfaces in H2SO4-CuSO4 solutions of various compositions (0.06 - 0.75 M CuSO4 + 2 M H2SO4) was studied using a copper self-cleaning rotating electrode. A decrease in the overvoltage on the continuously mechanically renewed electrode surface was observed in the Tafel region for all solution compositions investigated.
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