Microleakage assessment of a resin based sealant after acid etching and Er: YAG laser treatment: An in vitro study

Introduction Marginal adaptation of sealants is important element in prevention of dental caries. The failure of marginal adaptation leads to marginal leakage, passage of bacteria, fluids, molecules or ions between enamel and sealant, creating possibility for development of dental caries below the sealant. The aim of this study was to assess and compare microleakage of resin based sealant after acid etching and Er: YAG laser treatment of enamel. Materials and Methods An in vitro study included 30 premolars and molars extracted for orthodontic purpose, without any structural anomalies, and divided in the two groups of 15 samples. Group I included teeth with fissures sealed using resin based sealant (Helioseal-F, Ivoclar Vivadent AG, Liechtenstein) after enamel etching with 37% phosphoric acid. Group II consisted of teeth where fissures were sealed with resin based sealant (Helioseal-F, Ivoclar Vivadent AG, Liechtenstein) after enamel etching with Er: YAG laser (Fotona Light Walker Laser). Results In the group I, 10 (66.67%) samples demonstrated level 0 microleakage, 2 (13. 33%) samples demonstrated level 1 microleakage and 3 (20%) samples demonstrated level 3 microleakage. In the second group, 10 (66.67%) samples demonstrated level 0 microleakage, 1 (6.67%) demonstrated level 1 microleakage, 2 (13.33%) samples demonstrated level 2 microleakage and 2 (13.33%) samples showed level 3 microleakage. Descriptive statistics for microleakage resulted with mean score=0.73 for the first and second group. There was no statistically significant difference in chosen technique for etching occlusal enamel (37% phosphoric acid or Er: YAG Laser radiation) p>0,05 (p=0,98), when placing fissure sealants. Conclusion The use of Er: YAG Laser radiation for pits and fissures treatment, demonstrated excellent results and could replace the procedure of etching pits and fissures with phosphoric acid, with the same effect and without the negative impact of the phosphoric acid.