热处理后薄膜光学和结构性能的变化

A. Ekwealor, S. Offiah, S. Ezugwu, F. Ezema
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引用次数: 17

摘要

研究了热处理对化学浴沉积法在PVP孔隙中合成的氧化钴薄膜光学性能和结构性能的影响。沉积的薄膜呈结晶状。通过对薄膜的吸光度、透射比、反射率、折射率、吸收系数和消光系数的测量,得到了薄膜的光学性能。合成的薄膜为氧化钴(CoO(OH))纳米晶体。所得晶体尺寸为41.84 nm;然而,随着退火温度的升高,尺寸减小到16.28 nm。吸收系数、折射率和消光系数随退火温度的升高而增加,但不是依次增加。对于相同能量范围的入射光子,吸收系数和折射率分别为0.2 ~ 1.8和1.4 ~ 2.3。薄膜的能带宽度在1.96 ~ 2.22 eV之间。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Variations of Optical and Structural Properties of Thin Films with Thermal Treatment
The effects of thermal treatment on the optical and structural properties of cobalt oxide thin films synthesized in the pores of PVP by chemical bath deposition technique were investigated. Films deposited were crystalline. The optical properties of the films were got from absorbance, transmittance reflectance, refractive index, absorption coefficient, and extinction coefficient measurements. The synthesized films turned out to be cobalt oxyhydroxide , CoO(OH), nanocrystals. The crystals obtained were of size 41.84 nm; however, as annealing temperature increased, the size decreased to 16.28 nm. The absorption coefficient, refractive index, and extinction coefficient were found to increase with increase in annealing temperature though not sequentially. For the same energy ranges of the incident photons, the absorption coefficient and refractive index ranged from 0.2 to 1.8 and from 1.4 to 2.3, respectively. The energy band-gap of the films ranged from 1.96 eV to 2.22 eV.
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