不同电镀工艺制备的碲化镉薄膜的组成和结构性能的比较研究

Proceedings of 1994 IEEE 1st World Conference on Photovoltaic Energy Conversion - WCPEC (A Joint Conference of PVSC, PVSEC and PSEC) Pub Date : 1994-12-05 DOI:10.1109/WCPEC.1994.519968

P. Paulson, V. Dutta, C. Singh

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引用次数: 1

摘要

用脉冲电沉积、恒电位电沉积和恒流电流电沉积的方法，研究了CdSO/sub /和TeO水溶液中CdTe薄膜的结构和组成特性。在所有技术中都可以获得具有优选取向的多晶薄膜。然而，脉冲技术沉积的薄膜显示出更高的峰值强度。EDAX的一项研究表明，对于电解质中CdSO/sub - 4/浓度较低的情况下，脉冲膜比其他两种技术沉积的膜更具化学计量学意义。

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A comparative study of compositional and structural properties of CdTe thin films prepared by different electroplating techniques

The structural and compositional properties of CdTe films, deposited from an aqueous solution of CdSO/sub 4/ and TeO by pulsed electrodeposition, potentiostatic and galvanostatic electrodeposition, have been studied. Polycrystalline films with a preferred <111> orientation are obtained in all techniques. However, films deposited by pulsed techniques show the higher intensity for <111> peak. An EDAX study shows that, for lower concentrations of CdSO/sub 4/ in the electrolyte, pulsed films are more stoichiometric compared to films deposited by other two techniques.

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Proceedings of 1994 IEEE 1st World Conference on Photovoltaic Energy Conversion - WCPEC (A Joint Conference of PVSC, PVSEC and PSEC)

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