磷扩散热SiO2膜修饰MIS结构

IF 0.7 Q4 MATERIALS SCIENCE, MULTIDISCIPLINARY

High Temperature Material Processes Pub Date : 2018-01-01 DOI:10.1615/HIGHTEMPMATPROC.2018025450

Bondarenko Gennady Germanovich, Andreev Dmitriy Vladimirovich, Andreev Vladimir Viktorovich, Maslovsky Vladimir Mikhailovich, Stolyarov Aleksandr Alekseevich

引用次数: 0

摘要

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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Modification of MIS Structures with Thermal SiO2 Films by Phosphorus Diffusion

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来源期刊

High Temperature Material Processes 工程技术-材料科学：综合

CiteScore

1.20

自引率

25.00%

发文量

期刊介绍： High Temperature Material Processes is an important international publication devoted to original and invited review papers on fundamental and applied re-search and new developments in materials processing and synthesis at high temperatures, especially under the plasma action as well as the treatment by laser, ion and electron beams. Processes of interest include (but not limited to) surface treatments, alloying, coatings production, nanostructures synthesis, welding, cutting, melting, re-melting and purification of metals, metallurgy (among them plasma metallurgy), powder densification, ultra-fine powder production, waste conversion and destruction. In addition, attention is paid to the development, description and study of experimental and industrial systems and devices for the implementation of high-technology plasma and beam processes. Thus, there is a broad range of coverage of experimental, analytical and numerical studies. High Temperature Material Processes will serve the needs of those who develop high temperature processes to produce materials with improved properties, surface treatments or coatings with given specifications, and will also promote connections between laboratories and industry.