{"title":"丝网印刷磷掺杂膏体扩散优化在硅太阳能电池中的应用","authors":"Saima Cherukat, P. Basu, A. Kottantharayil","doi":"10.1109/icee44586.2018.8938027","DOIUrl":null,"url":null,"abstract":"We report the optimization of screen-printed phosphorus dopant paste diffusion on monocrystalline silicon wafers. The uniform sheet resistance and spatial selectivity offered by this diffusion approach make it promising for selective emitter, bifacial and interdigitated back contact solar cells. The sheet resistance, dopant profile and electrical characteristics of dopant paste diffused samples have been analyzed and the performance is benchmarked against conventional phosphorus oxychloride diffusion.","PeriodicalId":6590,"journal":{"name":"2018 4th IEEE International Conference on Emerging Electronics (ICEE)","volume":"62 1","pages":"1-4"},"PeriodicalIF":0.0000,"publicationDate":"2018-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":"{\"title\":\"Screen Printed Phosphorus Dopant Paste Diffusion optimization for Silicon Solar Cell Applications\",\"authors\":\"Saima Cherukat, P. Basu, A. Kottantharayil\",\"doi\":\"10.1109/icee44586.2018.8938027\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"We report the optimization of screen-printed phosphorus dopant paste diffusion on monocrystalline silicon wafers. The uniform sheet resistance and spatial selectivity offered by this diffusion approach make it promising for selective emitter, bifacial and interdigitated back contact solar cells. The sheet resistance, dopant profile and electrical characteristics of dopant paste diffused samples have been analyzed and the performance is benchmarked against conventional phosphorus oxychloride diffusion.\",\"PeriodicalId\":6590,\"journal\":{\"name\":\"2018 4th IEEE International Conference on Emerging Electronics (ICEE)\",\"volume\":\"62 1\",\"pages\":\"1-4\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2018-12-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"1\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2018 4th IEEE International Conference on Emerging Electronics (ICEE)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/icee44586.2018.8938027\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2018 4th IEEE International Conference on Emerging Electronics (ICEE)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/icee44586.2018.8938027","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Screen Printed Phosphorus Dopant Paste Diffusion optimization for Silicon Solar Cell Applications
We report the optimization of screen-printed phosphorus dopant paste diffusion on monocrystalline silicon wafers. The uniform sheet resistance and spatial selectivity offered by this diffusion approach make it promising for selective emitter, bifacial and interdigitated back contact solar cells. The sheet resistance, dopant profile and electrical characteristics of dopant paste diffused samples have been analyzed and the performance is benchmarked against conventional phosphorus oxychloride diffusion.
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