有机硅改性环氧丙烯酸酯紫外光热固化膜的表面性能

Q4 Engineering
Liu Hong-bo, Lin Feng, Xiao Wang-dong, X. Ling, Zhang Wu-ying
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引用次数: 0

摘要

以有机硅改性环氧单丙烯酸酯(OMEMA)为树脂制备了一系列紫外光热复合固化组合物。利用红外光谱分析了紫外光热固化过程中双键和环氧基团吸收峰的变化。研究了不同活性稀释剂种类和含量对紫外光热固化膜的凝胶含量、吸水性和水接触角的影响。用能谱仪(EDS)测定了紫外光热固化膜表面硅的质量含量。UV固化膜的凝胶含量低于86.5%,UV热固化膜的凝胶含量约为97%。与相同活性稀释剂的环氧单丙烯酸酯(EMA)组合物相比,OMEMA体系紫外光固化膜的水接触角由62.53提高到99.27。EDS测试数据证明,紫外热固化膜的空气侧Si含量高于玻璃侧Si含量。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Surface Properties of UV-Heat Cured Films of Organosilicon Modified Epoxy Monoacrylates
A series of UV-heat hybrid curable compositions were prepared by using organosilicon modified epoxy monoacrylates(OMEMA) as resins.The change of absorption peaks of double bond and epoxy group were identified by FTIR spectra during UV-heat curing process.The influence of different kinds and content of active diluents on the gel content,water absorption and water contact angle of UV-heat cured films were investigated.Mass content of Si in surface of UV-heat cured films was tested by the energy dispersive spectrometer(EDS).The gel contents of UV cured films were lower than 86.5%,and the gel contents of UV-heat cured films were about 97%.Compared to the epoxy monoacrylates(EMA) compositions with same active diluents,the water contact angle of UV-heat cured films of OMEMA system was increased from 62.53 to 99.27.The data of EDS testing proved that the Si content of air side of UV-heat cured films was higher than glass side.
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来源期刊
CiteScore
0.10
自引率
0.00%
发文量
1775
期刊介绍: Imaging Science and Photochemistry, which was started in 1983, published bimonthly. It was sponsored by Technical Institute of Physics and Chemistry,Chinese Academy of Sciences; Chinese Society for Imaging Science and Technology. Imaging Science and Photochemistry Reports the latest research status of Imaging science and photochemistry in new theory and technology for the promotion of international and domestic academic exchanges. Original research letter , research paper , research note , review, article of application, and development, and dissertation abstract are welcome to publish in the journal cover areas of imaging science and photochemistry and the areas of informational materials including information storage and recording materials.
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