光电应用中金属辅助化学蚀刻硅表面织构化的研究进展

S. D. Gall, R. Lachaume, E. Torralba, M. Halbwax, V. Magnin, T. E. Assimi, Marin Fouchier, J. Harari, J. Vilcot, C. Cachet-Vivier, S. Bastide
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引用次数: 0

摘要

探索了基于金属辅助化学蚀刻(MACE)的太阳能电池织构化硅新工艺。Pt和Au被认为是p型和n型Si衬底的MACE催化剂。在纳米尺度下的二维带弯曲模型表明,Pt纳米颗粒(NPs)会产生欧姆接触并诱导离域蚀刻。因此,实验得到了能有效降低反射率$(< 5\%)$的锥形大孔。相反,Au与n型Si会导致非欧姆接触和局部蚀刻。在此基础上,提出了一种利用纳米孔金电极一步将三维图案转移到硅中的新策略。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Advances in silicon surface texturization by metal assisted chemical etching for photovoltaic applications
New Si processes based on Metal Assisted Chemical Etching (MACE) are explored for solar cells texturization. Pt and Au are considered as catalysts for MACE of p and n-type Si substrates. 2D band bending modeling at the nanoscale shows that Pt nanoparticles (NPs) make ohmic contacts and induce delocalized etching. Accordingly, cone-shaped macropores, very efficient in reducing the reflectivity $(< 5\%)$ are obtained experimentally. On the contrary, Au with n-type Si leads to non-ohmic contacts and localized etching. On this basis, a novel strategy for 3D pattern transfer into Si with patterned nanoporous gold electrodes in a single step is developed.
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