低能高通量等离子体辐照等离子喷涂钨层的氘捕获特性

A. Rusinov, M. Sakamoto, 坂本 瑞樹, H. Zushi, 図子 秀樹, R. Ohyama, K. Honda, T. Tanabe, 田邉 哲朗, N. Yoshida, 吉田 直亮, ミズキ サカモト, ズシ ヒデキ, リョウヘイ オオヤマ, コウイチロウ ホンダ, テツオ タナベ, ナオアキ ヨシダ
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引用次数: 0

摘要

采用热解吸技术研究了低能等离子体辐照后钨等离子体喷涂层中氘的滞留和捕获。等离子体低温辐照(650 K)表明,与多晶材料相反,等离子体喷涂层中的滞留率显著增加。热解吸光谱显示其峰位温度极高,这是钨材料的非典型特征。讨论了高温辐照后等离子体喷涂层中氘潴留率高的可能原因和可能的捕获机制。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Deuterium trapping properties of plasma sprayed tungsten layers irradiated by low energy and high flux plasma
Deuterium retention and trapping in tungsten plasma sprayed layers after low energy plasma irradiation was investigated by means of thermal desorption technique. Plasma irradiation at low temperatures ( 650 K) showed significant increase of the retention in the plasma sprayed layers contrary to the polycrystalline material. Thermal desorption spectra showed extremely high temperatures of the peak positions which are non-typical for the tungsten materials. The possible reasons for such high deuterium retention in the plasma sprayed layers after irradiation at high temperatures and the possible trapping mechanisms are discussed.
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