富铜层对铝铜合金局部腐蚀的影响

IF 0.9 Q3 ENGINEERING, MULTIDISCIPLINARY

Revista Facultad De Ingenieria-universidad De Antioquia Pub Date : 2018-05-20 DOI:10.19053/01211129.V27.N48.2018.8016

María Ángeles Arenas-Vara, P. Skeldon, S. Garcia‐Vergara

{"title":"富铜层对铝铜合金局部腐蚀的影响","authors":"María Ángeles Arenas-Vara, P. Skeldon, S. Garcia‐Vergara","doi":"10.19053/01211129.V27.N48.2018.8016","DOIUrl":null,"url":null,"abstract":"Copper-enriched layers were developed onto aluminum-copper alloys using alkaline etching in sodium hydroxide, for both, sputter deposited and bulk conditions. Enriched alloys were evaluated by potentiodynamic polarization in sodium chloride solution in order to determine the effect of the enriched layers on the pitting potential of the alloys. Rutherford backscattering spectroscopy was employed to quantify the enrichments and their locations just beneath the alumina-based oxides remaining from the etching. For the sputter deposited aluminum-copper alloys, the results show some scattering of the pitting potential data, and no correlation between pitting potential and the alloy enriched layer. In the case of bulk Al-2wt.%Cu alloy, with the copper in solid-solution, the pitting potential increased for the enriched specimens, indicating also a different pit morphology, with respect to the non-enriched alloy.","PeriodicalId":21428,"journal":{"name":"Revista Facultad De Ingenieria-universidad De Antioquia","volume":null,"pages":null},"PeriodicalIF":0.9000,"publicationDate":"2018-05-20","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"2","resultStr":"{\"title\":\"Effect of copper-enriched layers on localized corrosion of aluminium-copper alloys\",\"authors\":\"María Ángeles Arenas-Vara, P. Skeldon, S. Garcia‐Vergara\",\"doi\":\"10.19053/01211129.V27.N48.2018.8016\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Copper-enriched layers were developed onto aluminum-copper alloys using alkaline etching in sodium hydroxide, for both, sputter deposited and bulk conditions. Enriched alloys were evaluated by potentiodynamic polarization in sodium chloride solution in order to determine the effect of the enriched layers on the pitting potential of the alloys. Rutherford backscattering spectroscopy was employed to quantify the enrichments and their locations just beneath the alumina-based oxides remaining from the etching. For the sputter deposited aluminum-copper alloys, the results show some scattering of the pitting potential data, and no correlation between pitting potential and the alloy enriched layer. In the case of bulk Al-2wt.%Cu alloy, with the copper in solid-solution, the pitting potential increased for the enriched specimens, indicating also a different pit morphology, with respect to the non-enriched alloy.\",\"PeriodicalId\":21428,\"journal\":{\"name\":\"Revista Facultad De Ingenieria-universidad De Antioquia\",\"volume\":null,\"pages\":null},\"PeriodicalIF\":0.9000,\"publicationDate\":\"2018-05-20\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"2\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Revista Facultad De Ingenieria-universidad De Antioquia\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.19053/01211129.V27.N48.2018.8016\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q3\",\"JCRName\":\"ENGINEERING, MULTIDISCIPLINARY\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Revista Facultad De Ingenieria-universidad De Antioquia","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.19053/01211129.V27.N48.2018.8016","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q3","JCRName":"ENGINEERING, MULTIDISCIPLINARY","Score":null,"Total":0}

引用次数: 2

摘要

采用氢氧化钠碱性蚀刻技术在铝铜合金上制备了富铜层，并对溅射沉积和大块沉积条件进行了研究。为了确定富集层对合金点蚀电位的影响，在氯化钠溶液中采用动电位极化法对富集合金进行了评价。卢瑟福后向散射光谱被用来量化富集物和它们在蚀刻后残留的氧化铝基氧化物下面的位置。对于溅射沉积的铝铜合金，点蚀电位数据有一定的散射，点蚀电位与合金富集层之间没有相关性。在散装Al-2wt的情况下。%Cu合金，当铜处于固溶状态时，富集试样的点蚀电位增大，表明其点蚀形态与非富集合金不同。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

查看原文本刊更多论文

Effect of copper-enriched layers on localized corrosion of aluminium-copper alloys

Copper-enriched layers were developed onto aluminum-copper alloys using alkaline etching in sodium hydroxide, for both, sputter deposited and bulk conditions. Enriched alloys were evaluated by potentiodynamic polarization in sodium chloride solution in order to determine the effect of the enriched layers on the pitting potential of the alloys. Rutherford backscattering spectroscopy was employed to quantify the enrichments and their locations just beneath the alumina-based oxides remaining from the etching. For the sputter deposited aluminum-copper alloys, the results show some scattering of the pitting potential data, and no correlation between pitting potential and the alloy enriched layer. In the case of bulk Al-2wt.%Cu alloy, with the copper in solid-solution, the pitting potential increased for the enriched specimens, indicating also a different pit morphology, with respect to the non-enriched alloy.

求助全文

通过发布文献求助，成功后即可免费获取论文全文。去求助

来源期刊

Revista Facultad De Ingenieria-universidad De Antioquia 工程技术-工程：综合

CiteScore

2.00

自引率

0.00%

发文量

审稿时长

2 months

期刊介绍： Revista Facultad de Ingenieria started in 1984 and is a publication of the School of Engineering at the University of Antioquia. The main objective of the journal is to promote and stimulate the publishing of national and international scientific research results. The journal publishes original articles, resulting from scientific research, experimental and or simulation studies in engineering sciences, technology, and similar disciplines (Electronics, Telecommunications, Bioengineering, Biotechnology, Electrical, Computer Science, Mechanical, Chemical, Environmental, Materials, Sanitary, Civil and Industrial Engineering). In exceptional cases, the journal will publish insightful articles related to current important subjects, or revision articles representing a significant contribution to the contextualization of the state of the art in a known relevant topic. Case reports will only be published when those cases are related to studies in which the validity of a methodology is being proven for the first time, or when a significant contribution to the knowledge of an unexplored system can be proven. All published articles have undergone a peer review process, carried out by experts recognized for their knowledge and contributions to the relevant field. To adapt the Journal to international standards and to promote the visibility of the published articles; and therefore, to have a greater impact in the global academic community, after November 1st 2013, the journal will accept only manuscripts written in English for reviewing and publication. Revista Facultad de Ingeniería –redin is entirely financed by University of Antioquia Since 2015, every article accepted for publication in the journal is assigned a DOI number.