钴对氧化镍基光致变色复合薄膜光致变色性能的改善

H. Miyazaki, Narumi Eimori, T. Matsuura, T. Ota
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引用次数: 3

摘要

制备了不同钴/镍(Co/Ni)比的氧化镍(NiO)基复合薄膜,并对其光致变色性能进行了评价。在Co/Ni比为0~0.02的复合膜中,NiO的粒径为40~70 nm。随着Co加入比的增加,复合膜的初始透过率降低,Co/Ni比为0.005和0.01时,复合膜的透过率调制幅度较大。在Co/Ni比为0.005时,膜的漂白率和著色率均有所提高。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Improvement in Photochromic Property of Nickel Oxide-Based Photochromic Composite Films by Cobalt Addition
Nickel oxide (NiO)-based composite films with various Cobalt/Nickel (Co/Ni) ratios were fabricated, and the photochromic properties of the resulting films were evaluated. The NiO particle sizes in the composite films with Co/Ni ratios of 0~0.02 were 40~70 nm. Increase in the Co addition ratio to the composite films caused a decrease in the initial transmittance of the films, and the films with Co/Ni ratio of 0.005 and 0.01 showed a larger transmittance modulation. Co addition caused an increase in the bleaching and coloring rates, which were the largest in the film with Co/Ni ratio of 0.005.
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