等离子喷涂Inconel 738 Si3N4涂层的优化

IF 1.6 Q4 MATERIALS SCIENCE, COATINGS & FILMS
Mojtaba Najafizadeh, M. Ghasempour-Mouziraji, Sajad Shahrani, M. Bozorg, C. Goulas, M. Hosseinzadeh, P. Cavaliere, A. Perrone, S. Perrone
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引用次数: 0

摘要

本文研究了等离子喷涂法在Inconel 738表面沉积氮化硅(Si3N4)涂层。在制备氮化硅涂层时,采用了不同的时间(6、8和10 s),等离子喷涂炬距离基体的距离(30、35和40 mm)以及不同的等离子喷涂电流(3000、3250和3500 A)。通过扫描电镜(SEM)、x射线衍射(XRD)、显微硬度和附着力对涂层进行表征。通过扫描电镜研究了涂层的表面形貌。实验结果表明,在喷涂时间为10 s、喷枪距离为40 mm、电流为3500 a的条件下,涂层具有较高的显微硬度和附着力。另一方面,减小喷涂距离,增加喷涂时间和电流,涂层厚度增加。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Optimization of the Si3N4 coating formation through plasma spraying on Inconel 738
ABSTRACT In the present study, the deposition of silicon nitride (Si3N4) coating on Inconel 738 through plasma spray has been investigated. For producing the Si3N4 coating, different times (6, 8 and 10 s), different distances of the plasma spray torch from the substrate (30, 35 and 40 mm) and different currents for plasma spraying (3000, 3250 and 3500 A) were employed. For the characterisation of the coatings, SEM (thickness), XRD, micro-hardness and adhesion of the samples were measured. The coatings’ surface morphology was investigated through SEM. Based on the experimental results, by using a spraying time of 10 s, a distance of the torch of 40 mm and a current of 3500 A, high microhardness and adhesion of the coatings are obtained. On the other hand, the thickness of the coating increased by reducing the distance and increasing spray time and current.
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来源期刊
Tribology - Materials, Surfaces & Interfaces
Tribology - Materials, Surfaces & Interfaces MATERIALS SCIENCE, COATINGS & FILMS-
CiteScore
2.80
自引率
0.00%
发文量
15
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