利用x射线衍射和晶圆曲率对金属薄膜-硅反应相形成和应力演化进行了原位研究

{"title":"利用x射线衍射和晶圆曲率对金属薄膜-硅反应相形成和应力演化进行了原位研究","authors":"O. Thomas","doi":"10.1524/ZKRI.2007.2007.SUPPL_26.81","DOIUrl":null,"url":null,"abstract":"","PeriodicalId":23897,"journal":{"name":"Zeitschrift Fur Kristallographie","volume":"13 1","pages":"81-89"},"PeriodicalIF":0.0000,"publicationDate":"2007-11-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"In-situ investigation by X-ray diffraction and wafer curvature of phase formation and stress evolution during metal thin film – silicon reactions\",\"authors\":\"O. Thomas\",\"doi\":\"10.1524/ZKRI.2007.2007.SUPPL_26.81\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"\",\"PeriodicalId\":23897,\"journal\":{\"name\":\"Zeitschrift Fur Kristallographie\",\"volume\":\"13 1\",\"pages\":\"81-89\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2007-11-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Zeitschrift Fur Kristallographie\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1524/ZKRI.2007.2007.SUPPL_26.81\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q2\",\"JCRName\":\"Chemistry\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Zeitschrift Fur Kristallographie","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1524/ZKRI.2007.2007.SUPPL_26.81","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"Chemistry","Score":null,"Total":0}