在998 ~ 1123 K之间用Cl2氯化氧化RuO2

{"title":"在998 ~ 1123 K之间用Cl2氯化氧化RuO2","authors":"Cristina N. Guibaldo, G. Micco, A. Bohé","doi":"10.1016/J.MSPRO.2015.04.144","DOIUrl":null,"url":null,"abstract":"","PeriodicalId":101041,"journal":{"name":"Procedia Materials Science","volume":"20 1","pages":"841-850"},"PeriodicalIF":0.0000,"publicationDate":"2015-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":"{\"title\":\"Chlorination of RuO2 with gaseous Cl2 between 998 and 1123 K\",\"authors\":\"Cristina N. Guibaldo, G. Micco, A. Bohé\",\"doi\":\"10.1016/J.MSPRO.2015.04.144\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"\",\"PeriodicalId\":101041,\"journal\":{\"name\":\"Procedia Materials Science\",\"volume\":\"20 1\",\"pages\":\"841-850\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2015-01-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"1\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Procedia Materials Science\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1016/J.MSPRO.2015.04.144\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Procedia Materials Science","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1016/J.MSPRO.2015.04.144","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}