直流磁控溅射参数对二硼化钽薄膜结构、组成及摩擦学性能的影响

2017 IEEE 7th International Conference Nanomaterials: Application & Properties (NAP) Pub Date : 2017-09-01 DOI:10.1109/NAP.2017.8190168

A. Pogrebnjak, A. Goncharov, A. Yunda, I. Shelest, V. Buranich, P. Konarski, P. Budzyński

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引用次数: 0

摘要

采用直流磁控溅射系统，在不同溅射条件下在不锈钢衬底上沉积了二硼化钽薄膜。对样品进行了x射线衍射分析。采用卢瑟福后向散射和二次离子质谱法对涂层成分进行了深入研究。采用“销盘”法测定了涂层的摩擦系数和磨损量。研究了不同沉积方式对涂层结构、组成和摩擦学性能的影响。

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Effect of DC magnetron sputtering parameters on the structure, composition and tribological properties of tantalum diboride films

Tantalum diboride films were deposited on stainless steel substrates using a direct current magnetron sputtering system under various sputtering conditions. X-ray diffraction analysis of the samples was carried out. Study of the coatings composition in depth was carried out using Rutherford backscattering and secondary ion mass spectrometry methods. The friction coefficient and wear of the coatings were determined by the “Pin-on-disk” method. The effect of deposition regimes on the structure, composition and tribological properties of the obtained coatings had been evaluated.

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2017 IEEE 7th International Conference Nanomaterials: Application & Properties (NAP)

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