荫罩磁化对电子束轨迹影响的模拟

H. Nasuno;A. Haga;T. Kanbayashi;K. Yamane
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引用次数: 0

摘要

众所周知,在彩色CRT中,由于环境磁场对荫罩和框架的磁化,颜色发生变化。为了定量阐明掩模和框架的影响,我们使用积分方程方法分析了荫罩和框架在环境场作用下的磁化强度。使用导出的磁场分布计算电子束轨迹,并计算误着陆以获得颜色变化的定量评估。数值分析结果与实验吻合较好,有助于阐明屏蔽与误着陆量的关系。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
A Simulation of the Influence of the Magnetization of the Shadow Mask on the Electron Beam Trajectory
It is well known that in color CRTs, color changes occur as the result of magnetization of the shadow mask and frame by an ambient magnetic field. In order to clarify the influence of the mask and frame quantitatively, we used an integral equation method to analyze the magnetization resulting when a shadow mask and frame are subjected to an ambient field. The electron beam trajectories were calculated using the derived magnetic field distributions, and the mislanding was computed to obtain a quantitative evaluation of the color change. The results of the numerical analysis agree well with experiment, and help to clarify the relation of the shielding to the amount of mislanding.
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