立体光刻过程中薄壁结构畸变的全息干涉测量

S. Lychev, P. Bychkov, I. Saifutdinov
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引用次数: 4

摘要

本文旨在对立体光刻技术制造的薄壁结构的几何形状畸变进行实验研究。提出可以利用单个中间层或最终层固化引起的畸变的实验数据来估计由逐层光聚合引起的总畸变。实验使用了一个空心立方体形式的样本。用时间平均全息干涉法记录立方体的畸变。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Holographic Interferometry of Thin-walled Structure Distortion During the Stereolithography Process

The present paper aimed at experimental study for the distortion of geometrical shape of thin walled structures manufactured by stereolithography technologies. It is proposed that total distortion occurring due to layer-by-layer photopolymerisation can be estimate using experimental data about distortion caused by curing single intermediate or final layer. The experiments used a sample in the form of a hollow cube. The distortion of the cube is recorded using time-average holographic interferometry.

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