大截面梁EBC机适用于高速线路IRELEC“层流”概念

Radiation Physics and Chemistry (1977) Pub Date : 1985-01-01 DOI:10.1016/0146-5724(85)90147-5

F. Danel, J.L. Rechatin

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引用次数: 0

摘要

二次发射源“层流过程”允许光束在两个方向上的截面延伸，并控制光束任何地方的剂量密度。因此，剂量率是可以调制的，并且没有光束施加到窗口的支撑上，从而允许更高的通量和更少的冷却问题。这一发展促使我们开发出一种新型的低泄漏和自动适应待处理产品厚度的惰化室。

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EBC machine with large section beam adapted on high speed lines IRELEC “Laminar” concept

Secondary emission sources “Laminar Process” allow the extension of the section of the beam in two directions and to control the density of the dose in any place of the beam.

Consequently the dose rate can be modulated and no beam is applied to the support of the window which allows much higher flux and less cooling problems.

This development has pushed us to develop a new type of inerting chamber with low leakage and automatic adaptation to the thickness of the product to be treated.

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来源期刊

Radiation Physics and Chemistry (1977)

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