通过气溶胶辅助CVD制备具有可调谐晶体取向的氧化镁薄膜

Chemical Vapor Deposition Pub Date : 2015-05-04 DOI:10.1002/cvde.201507156

Sapna D. Ponja, Ivan P. Parkin, Claire J. Carmalt

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引用次数: 3

摘要

通过气溶胶辅助(AA)气相沉积法在玻璃上沉积氧化镁薄膜。在400,500和600°C下，使用四水乙酸镁在乙醇或甲醇中进行沉积。用各种方法分析电影。生长速率、薄膜厚度和晶粒尺寸随温度的升高而增加，与溶剂无关。薄膜是结晶的，晶体学的首选取向随溶剂和温度的变化而变化，允许对工业应用进行微调。溶剂和温度影响表面形貌;与甲醇衍生膜的无特征形态相比，用乙醇沉积的膜具有较小的表面结构。甲醇和乙醇体系的折射率分别为1.72和1.70。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

Magnesium Oxide Thin Films with Tunable Crystallographic Preferred Orientation via Aerosol-Assisted CVD†

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Magnesium Oxide Thin Films with Tunable Crystallographic Preferred Orientation via Aerosol-Assisted CVD†

Magnesium oxide films are deposited on glass via aerosol-assisted (AA)CVD. Depositions using magnesium acetate tetrahydrate in ethanol or methanol are carried out at 400, 500, and 600 °C. Films are analyzed by various methods. Growth rate, film thickness, and crystallite size increase with temperature, regardless of solvent. The films are crystalline and the crystallographic preferred orientation varies with solvent and temperature, allowing fine-tuning for industrial applications. Solvent and temperature influence the surface morphology; films deposited using ethanol consist of small surface structures compared to the featureless morphology of methanol-derived films. The refractive index of the films is 1.72 for methanol and 1.70 for ethanol systems.

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来源期刊

Chemical Vapor Deposition 工程技术-材料科学：膜

自引率

0.00%

发文量

审稿时长

>12 weeks

期刊介绍： Chemical Vapor Deposition (CVD) publishes Reviews, Short Communications, and Full Papers on all aspects of chemical vapor deposition and related technologies, along with other articles presenting opinion, news, conference information, and book reviews. All papers are peer-reviewed. The journal provides a unified forum for chemists, physicists, and engineers whose publications on chemical vapor deposition have in the past been spread over journals covering inorganic chemistry, materials chemistry, organometallics, applied physics and semiconductor technology, thin films, and ceramic processing.