聚焦电子束诱导的铁的CVD:直接写入的实用指南†

Chemical Vapor Deposition Pub Date : 2014-08-20 DOI:10.1002/cvde.201407118

Marco Gavagnin, Heinz D. Wanzenboeck, Mostafa M. Shawrav, Domagoj Belic, Stefan Wachter, Simon Waid, Michael Stoeger–Pollach, Emmerich Bertagnolli

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引用次数: 15

摘要

纳米级合成的磁性材料在自旋电子学和磁学等领域具有重要的应用价值。作为一种成功的纳米制造方法，聚焦电子束诱导沉积(FEBID)作为一种直接写入技术脱颖而出。FEBID使用电子束局部诱导CVD过程，避免使用掩膜和电阻。本研究以五羰基铁为起始原料，用FEBID在Si(100)上合成了铁基纳米结构。对FEBID参数进行了系统的变化，以研究它们对矿床几何形状和组成的影响。在此基础上，提出了磁逻辑应用和大型结构制造的具体沉积条件。

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Focused Electron Beam-Induced CVD of Iron: a Practical Guide for Direct Writing†

Magnetic materials synthesized on the nanometer-scale level are essential for several applications, such as spintronics and magnetologic. As a successful nanofabrication approach, focused electron beam-induced deposition (FEBID) stands out as a direct-write technique. FEBID uses an electron beam to locally induce a CVD process, avoiding the use of masks and resists. In this work, Fe–based nanostructures are synthesized on Si(100) by FEBID, starting from iron pentacarbonyl. A systematic variation of FEBID parameters is performed, to study their influence on the geometry and composition of the deposit. Based on the results, specific deposition conditions are suggested for magneto-logic applications and fabrication of large structures.

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来源期刊

Chemical Vapor Deposition 工程技术-材料科学：膜

自引率

0.00%

发文量

审稿时长

>12 weeks

期刊介绍： Chemical Vapor Deposition (CVD) publishes Reviews, Short Communications, and Full Papers on all aspects of chemical vapor deposition and related technologies, along with other articles presenting opinion, news, conference information, and book reviews. All papers are peer-reviewed. The journal provides a unified forum for chemists, physicists, and engineers whose publications on chemical vapor deposition have in the past been spread over journals covering inorganic chemistry, materials chemistry, organometallics, applied physics and semiconductor technology, thin films, and ceramic processing.