单层石墨烯上的生物大分子在 MeV Cn+(n = 1-6)冲击下向前和向后发射二次离子

IF 1.4 3区 物理与天体物理 Q3 INSTRUMENTS & INSTRUMENTATION
Naruki Uno , Takuya Majima , Manabu Saito , Kaoru Nakajima , Hidetsugu Tsuchida
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引用次数: 0

摘要

我们研究了在透射二次离子质谱仪中使用具有 MeV 能量的簇离子发射二次离子的情况。使用的一级离子为 0.6 MeV/原子的 Cn+,其中 n 为 1 至 6。单层石墨烯被用作沉积苯丙氨酸生物分子靶的支撑膜。我们分别测量了正向和反向发射的正离子。我们发现,向前发射的二次离子的产率高于向后发射的二次离子。我们的结果表明,随着入射团簇离子大小的增加,在两个方向发射的二次离子的产率都会增加。这种增加是非线性的,可归因于入射团簇离子的轨道重叠效应。我们还发现了一个缩放参数,该参数一致地描述了入射团簇大小对正向和反向发射的二次离子产率的依赖性。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Forward and backward emission of secondary ions from biomolecules on single-layer graphene by MeV Cn+ (n = 1–6) impacts
We studied the emission of secondary ions using a cluster ion with MeV energy in transmission secondary ion mass spectrometry. The primary ions used were 0.6 MeV/atom Cn+, where n ranges from 1 to 6. Single-layer graphene was used as a support membrane for depositing a biomolecular target of phenylalanine. Positive secondary ions emitted in both forward and backward directions were measured separately. We found that the yield of forward-emitted secondary ions was higher than that of backward-emitted secondary ions. Our results showed that the yield of secondary ions emitted in both directions increased as the size of incident cluster ions increased. This increase was non-linear and can be attributed to the track overlap effect of incident cluster ions. We also found a scaling parameter consistently describing the incident cluster size dependence of the forward and backward-emitted secondary ion yields.
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来源期刊
CiteScore
2.80
自引率
7.70%
发文量
231
审稿时长
1.9 months
期刊介绍: Section B of Nuclear Instruments and Methods in Physics Research covers all aspects of the interaction of energetic beams with atoms, molecules and aggregate forms of matter. This includes ion beam analysis and ion beam modification of materials as well as basic data of importance for these studies. Topics of general interest include: atomic collisions in solids, particle channelling, all aspects of collision cascades, the modification of materials by energetic beams, ion implantation, irradiation - induced changes in materials, the physics and chemistry of beam interactions and the analysis of materials by all forms of energetic radiation. Modification by ion, laser and electron beams for the study of electronic materials, metals, ceramics, insulators, polymers and other important and new materials systems are included. Related studies, such as the application of ion beam analysis to biological, archaeological and geological samples as well as applications to solve problems in planetary science are also welcome. Energetic beams of interest include atomic and molecular ions, neutrons, positrons and muons, plasmas directed at surfaces, electron and photon beams, including laser treated surfaces and studies of solids by photon radiation from rotating anodes, synchrotrons, etc. In addition, the interaction between various forms of radiation and radiation-induced deposition processes are relevant.
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