利用双极-HiPIMS 在管中超快沉积超硬铬薄膜，目标-基底距离小

IF 3.8 2区材料科学 Q2 MATERIALS SCIENCE, MULTIDISCIPLINARY

Vacuum Pub Date : 2024-10-21 DOI:10.1016/j.vacuum.2024.113759

Tianshi Hu, Benfu Wang, Xiubo Tian, Chunzhi Gong

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引用次数: 0

摘要

PVD 沉积具有优异表面特性的薄膜一直是研究的热点。本文提出了靶-基片间距较小的双极高功率脉冲磁控溅射技术，并在试管中以较高的速率沉积了超硬铬薄膜。利用 X 射线衍射、扫描电子显微镜、纳米压痕和划痕测试对薄膜的微观结构和机械性能进行了表征，并与传统条件下制备的薄膜进行了比较。在目标-基底距离为 7.5 毫米的条件下，通过高密度等离子体中的高强度辉光放电和直接粒子轰击，制备出了超细柱状结构。尽管沉积速率高达 10 μm/hr，但观察到的晶粒尺寸很小，为 7.4 ± 0.3 nm。薄膜的纳米硬度达到 19.94 ± 1.14 GPa，远高于文献报道。同时，薄膜与基底之间的附着力可高达 77 ± 5 N。

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Ultrafast deposition of ultrahard Cr films in tubes by bipolar-HiPIMS with small target-substrate distance

The PVD deposition of films with excellent surface properties has been a persistent area of research. In this paper, bipolar high power impulse magnetron sputtering with small target-substrate distance is proposed, and ultra-hard Cr films have been deposited with a higher rate in tubes. The microstructure and mechanical properties of the films were characterized using X-ray diffraction, scanning electron microscopy, nanoindentation and scratch test, and compared with films prepared under conventional conditions. With target-substrate distance of 7.5 mm, the ultrafine columnar structure is fabricated due to intensive glow discharge and direct particle-bombardment in high-density plasma. The small grain size of 7.4 ± 0.3 nm is observed although deposition rate as high as 10 μm/hr. The nanohardness of the films reaches 19.94 ± 1.14 GPa, much higher than that reported in the literatures. Meanwhile, the adhesion between film and substrate may be as high as 77 ± 5 N.

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来源期刊

Vacuum 工程技术-材料科学：综合

CiteScore

6.80

自引率

17.50%

发文量

审稿时长

34 days

期刊介绍： Vacuum is an international rapid publications journal with a focus on short communication. All papers are peer-reviewed, with the review process for short communication geared towards very fast turnaround times. The journal also published full research papers, thematic issues and selected papers from leading conferences. A report in Vacuum should represent a major advance in an area that involves a controlled environment at pressures of one atmosphere or below. The scope of the journal includes: 1. Vacuum; original developments in vacuum pumping and instrumentation, vacuum measurement, vacuum gas dynamics, gas-surface interactions, surface treatment for UHV applications and low outgassing, vacuum melting, sintering, and vacuum metrology. Technology and solutions for large-scale facilities (e.g., particle accelerators and fusion devices). New instrumentation ( e.g., detectors and electron microscopes). 2. Plasma science; advances in PVD, CVD, plasma-assisted CVD, ion sources, deposition processes and analysis. 3. Surface science; surface engineering, surface chemistry, surface analysis, crystal growth, ion-surface interactions and etching, nanometer-scale processing, surface modification. 4. Materials science; novel functional or structural materials. Metals, ceramics, and polymers. Experiments, simulations, and modelling for understanding structure-property relationships. Thin films and coatings. Nanostructures and ion implantation.