卤化物吸附影响扫描隧穿显微镜断点的回弹距离

IF 4.7 3区工程技术 Q2 ELECTROCHEMISTRY

Electrochemistry Communications Pub Date : 2024-10-02 DOI:10.1016/j.elecom.2024.107821

Chanyuan Huo , Andrea Vezzoli , Natasa Vasiljevic , Walther Schwarzacher

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引用次数: 0

摘要

回跳距离 "是指原子尺度金属触点断裂后立即形成的间隙迅速增大。这是扫描隧道显微镜断裂结（STM-BJ）和机械控制断裂结（MCBJ）实验中经常观察到的现象。在此，我们展示了在含有卤化物阴离子的电解液中，纯水中的金断口测量到的回扣距离显著减小。就 Br- 而言，电化学控制下的实验提供了明确的证据，证明这一缩短是由金表面的卤化物吸附造成的。

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Halide adsorption influences snapback distance in Scanning Tunnelling Microscope break junctions

‘Snapback distance’ refers to the rapid increase in the size of the gap formed immediately after breaking an atomic-scale metallic contact. It is a commonly observed phenomenon in Scanning Tunnelling Microscope break junction (STM-BJ) and mechanically controlled break junction (MCBJ) experiments. Here, we show that the snapback distance measured for a gold break junction in pure water was significantly reduced in an electrolyte containing halide anions. In the case of Br⁻, experiments under electrochemical control provided clear evidence that this reduction was caused by halide adsorption on the surface of the gold.

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来源期刊

Electrochemistry Communications 工程技术-电化学

CiteScore

8.50

自引率

3.70%

发文量

160

审稿时长

1.2 months

期刊介绍： Electrochemistry Communications is an open access journal providing fast dissemination of short communications, full communications and mini reviews covering the whole field of electrochemistry which merit urgent publication. Short communications are limited to a maximum of 20,000 characters (including spaces) while full communications and mini reviews are limited to 25,000 characters (including spaces). Supplementary information is permitted for full communications and mini reviews but not for short communications. We aim to be the fastest journal in electrochemistry for these types of papers.