在 2-14 μm 范围内测量电子元件热管理材料的正常光谱发射率

IF 3.1 3区 物理与天体物理 Q2 INSTRUMENTS & INSTRUMENTATION
Yang Wang , Yongao Zhao , Xu Zhang , Yufeng Zhang , Jingmin Dai
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引用次数: 0

摘要

降低电子元件的工作温度是提高其性能的有效方法。选择合适的热管理材料对于优化冷却效率至关重要。正常光谱发射率是一个无量纲物理量,是评估材料辐射冷却能力的关键。本文概述了使用 IS-50 傅立叶变换红外光谱仪构建反射式红外发射率测量仪器的过程。在光谱仪的样品室中战略性地放置了一个金涂层漫射积分球。通过巧妙地利用光谱仪的原始光路,采用双面镀金镜来捕捉入射光和反射光,从而实现了对用于冷却电子元件的材料的正常光谱发射率的精确测量。典型材料的测量结果与文献报道的结果一致,令人满意。对测量装置的不确定性进行了全面评估,综合不确定性优于 1%。这项实验研究测量了各种热管理材料的正常光谱发射率,并分析了温度对正常光谱发射率的影响。这些结果为电子元件热结构开发过程中的热设计、模拟分析和温度监控提供了重要的数据支持。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Normal spectral emissivity measurement of thermal management materials for electronic components in the 2–14 μm range
Reducing the operating temperature of electronic components is an effective method for enhancing their performance. Selecting suitable thermal management materials is crucial for optimizing cooling efficiency. Normal spectral emissivity, a dimensionless physical quantity, is key in assessing a material’s capability for radiative cooling. This paper outlines the construction of a reflective infrared emissivity measurement apparatus using the IS-50 Fourier Transform Infrared Spectrometer. A gold-coated diffuse integrating sphere was strategically placed in the spectrometer’s sample chamber. By ingeniously leveraging the spectrometer’s original optical path, a dual-sided gold-coated mirror was employed to capture both incident and reflected light, enabling accurate measurements of the normal spectral emissivity of materials used for cooling electronic components. The measurement results for typical materials were consistent with those reported in the literature, satisfyingly so. The uncertainty of the measurement setup was thoroughly evaluated, achieving a combined uncertainty of better than 1 %. This experimental study measured the normal spectral emissivity of various thermal management materials and analyzed the influence of temperature on normal spectral emissivity. These results provide crucial data support for thermal design, simulation analysis, and temperature monitoring in the development of thermal structures for electronic components.
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来源期刊
CiteScore
5.70
自引率
12.10%
发文量
400
审稿时长
67 days
期刊介绍: The Journal covers the entire field of infrared physics and technology: theory, experiment, application, devices and instrumentation. Infrared'' is defined as covering the near, mid and far infrared (terahertz) regions from 0.75um (750nm) to 1mm (300GHz.) Submissions in the 300GHz to 100GHz region may be accepted at the editors discretion if their content is relevant to shorter wavelengths. Submissions must be primarily concerned with and directly relevant to this spectral region. Its core topics can be summarized as the generation, propagation and detection, of infrared radiation; the associated optics, materials and devices; and its use in all fields of science, industry, engineering and medicine. Infrared techniques occur in many different fields, notably spectroscopy and interferometry; material characterization and processing; atmospheric physics, astronomy and space research. Scientific aspects include lasers, quantum optics, quantum electronics, image processing and semiconductor physics. Some important applications are medical diagnostics and treatment, industrial inspection and environmental monitoring.
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