氢等离子体抑制 GaP 的离子束重组。

IF 8.3 2区 材料科学 Q1 MATERIALS SCIENCE, MULTIDISCIPLINARY
John A Scott, James Bishop, Garrett Budnik, Milos Toth
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引用次数: 0

摘要

聚焦离子束(FIB)技术被广泛应用于材料和设备的纳米制造和加工。然而,离子辐照往往会造成严重破坏,因为原子位移会导致离子-固体相互作用体积内缺陷的形成、迁移和聚集。由此产生的结构重组会降低材料的功能性,并限制 FIB 烧蚀和纳米制造技术的应用。在这里,我们展示了在氢等离子环境中进行 FIB 照射,通过化学途径改变缺陷结合能和传输动力学以及材料烧蚀率,可以抑制这种重组。该方法创伤极小,有望极大地扩展 FIB 纳米制造技术在功能材料和器件加工中的应用。
本文章由计算机程序翻译,如有差异,请以英文原文为准。

Hydrogen Plasma Inhibits Ion Beam Restructuring of GaP.

Hydrogen Plasma Inhibits Ion Beam Restructuring of GaP.

Focused ion beam (FIB) techniques are employed widely for nanofabrication and processing of materials and devices. However, ion irradiation often gives rise to severe damage due to atomic displacements that cause defect formation, migration, and clustering within the ion-solid interaction volume. The resulting restructuring degrades the functionality of materials and limits the utility of FIB ablation and nanofabrication techniques. Here we show that such restructuring can be inhibited by performing FIB irradiation in a hydrogen plasma environment via chemical pathways that modify defect binding energies and transport kinetics, as well as material ablation rates. The method is minimally invasive and has the potential to greatly expand the utility of FIB nanofabrication techniques in processing functional materials and devices.

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来源期刊
ACS Applied Materials & Interfaces
ACS Applied Materials & Interfaces 工程技术-材料科学:综合
CiteScore
16.00
自引率
6.30%
发文量
4978
审稿时长
1.8 months
期刊介绍: ACS Applied Materials & Interfaces is a leading interdisciplinary journal that brings together chemists, engineers, physicists, and biologists to explore the development and utilization of newly-discovered materials and interfacial processes for specific applications. Our journal has experienced remarkable growth since its establishment in 2009, both in terms of the number of articles published and the impact of the research showcased. We are proud to foster a truly global community, with the majority of published articles originating from outside the United States, reflecting the rapid growth of applied research worldwide.
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