不同气体环境下脉冲激光沉积钨多孔薄膜的形成条件

IF 1.5 4区物理与天体物理 Q3 PHYSICS, APPLIED

Japanese Journal of Applied Physics Pub Date : 2024-09-17 DOI:10.35848/1347-4065/ad759a

S. Kodate, Q. Shi and S. Kajita

{"title":"不同气体环境下脉冲激光沉积钨多孔薄膜的形成条件","authors":"S. Kodate, Q. Shi and S. Kajita","doi":"10.35848/1347-4065/ad759a","DOIUrl":null,"url":null,"abstract":"Pulsed laser deposition (PLD) under gas atmospheres has been used to fabricate thin films for various applications. In this study, PLD was performed under various gas atmospheres (helium, oxygen, and argon) using tungsten (W) to investigate the morphology of thin films. Various types of structures were formed, including uniform, nanoparticles, and columnar structures. In particular, the substrate fabricated at an argon pressure of 100 Pa had a high porosity and a low light reflectance in the 200–1400 nm wavelength range. In addition, it was shown that the growth of the thin film thickness was non-linear with respect to time, and the formation of a fuzz-like structure may be influenced by particle diffusion in the gas phase and on the substrate.","PeriodicalId":14741,"journal":{"name":"Japanese Journal of Applied Physics","volume":"190 1","pages":""},"PeriodicalIF":1.5000,"publicationDate":"2024-09-17","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Formation conditions of the tungsten porous thin film with pulsed laser deposition under various gas atmosphere\",\"authors\":\"S. Kodate, Q. Shi and S. Kajita\",\"doi\":\"10.35848/1347-4065/ad759a\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Pulsed laser deposition (PLD) under gas atmospheres has been used to fabricate thin films for various applications. In this study, PLD was performed under various gas atmospheres (helium, oxygen, and argon) using tungsten (W) to investigate the morphology of thin films. Various types of structures were formed, including uniform, nanoparticles, and columnar structures. In particular, the substrate fabricated at an argon pressure of 100 Pa had a high porosity and a low light reflectance in the 200–1400 nm wavelength range. In addition, it was shown that the growth of the thin film thickness was non-linear with respect to time, and the formation of a fuzz-like structure may be influenced by particle diffusion in the gas phase and on the substrate.\",\"PeriodicalId\":14741,\"journal\":{\"name\":\"Japanese Journal of Applied Physics\",\"volume\":\"190 1\",\"pages\":\"\"},\"PeriodicalIF\":1.5000,\"publicationDate\":\"2024-09-17\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Japanese Journal of Applied Physics\",\"FirstCategoryId\":\"101\",\"ListUrlMain\":\"https://doi.org/10.35848/1347-4065/ad759a\",\"RegionNum\":4,\"RegionCategory\":\"物理与天体物理\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q3\",\"JCRName\":\"PHYSICS, APPLIED\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Japanese Journal of Applied Physics","FirstCategoryId":"101","ListUrlMain":"https://doi.org/10.35848/1347-4065/ad759a","RegionNum":4,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q3","JCRName":"PHYSICS, APPLIED","Score":null,"Total":0}

引用次数: 0

摘要

气体环境下的脉冲激光沉积（PLD）已被用于制造各种用途的薄膜。本研究使用钨（W）在各种气体环境（氦气、氧气和氩气）下进行了脉冲激光沉积，以研究薄膜的形态。形成了各种类型的结构，包括均匀结构、纳米颗粒结构和柱状结构。特别是在氩气压力为 100 Pa 时制造的基底具有高孔隙率和 200-1400 nm 波长范围内的低光反射率。此外，研究还表明，薄膜厚度的增长与时间呈非线性关系，绒毛状结构的形成可能受到气相中和基底上颗粒扩散的影响。

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Formation conditions of the tungsten porous thin film with pulsed laser deposition under various gas atmosphere

Pulsed laser deposition (PLD) under gas atmospheres has been used to fabricate thin films for various applications. In this study, PLD was performed under various gas atmospheres (helium, oxygen, and argon) using tungsten (W) to investigate the morphology of thin films. Various types of structures were formed, including uniform, nanoparticles, and columnar structures. In particular, the substrate fabricated at an argon pressure of 100 Pa had a high porosity and a low light reflectance in the 200–1400 nm wavelength range. In addition, it was shown that the growth of the thin film thickness was non-linear with respect to time, and the formation of a fuzz-like structure may be influenced by particle diffusion in the gas phase and on the substrate.

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来源期刊

Japanese Journal of Applied Physics 物理-物理：应用

CiteScore

3.00

自引率

26.70%

发文量

818

审稿时长

3.5 months

期刊介绍： The Japanese Journal of Applied Physics (JJAP) is an international journal for the advancement and dissemination of knowledge in all fields of applied physics. JJAP is a sister journal of the Applied Physics Express (APEX) and is published by IOP Publishing Ltd on behalf of the Japan Society of Applied Physics (JSAP). JJAP publishes articles that significantly contribute to the advancements in the applications of physical principles as well as in the understanding of physics in view of particular applications in mind. Subjects covered by JJAP include the following fields: • Semiconductors, dielectrics, and organic materials • Photonics, quantum electronics, optics, and spectroscopy • Spintronics, superconductivity, and strongly correlated materials • Device physics including quantum information processing • Physics-based circuits and systems • Nanoscale science and technology • Crystal growth, surfaces, interfaces, thin films, and bulk materials • Plasmas, applied atomic and molecular physics, and applied nuclear physics • Device processing, fabrication and measurement technologies, and instrumentation • Cross-disciplinary areas such as bioelectronics/photonics, biosensing, environmental/energy technologies, and MEMS