静电效应对解读自组装单层膜 X 射线光发射光谱的重要性

IF 4.3 3区 材料科学 Q2 CHEMISTRY, MULTIDISCIPLINARY
Michael Zharnikov
{"title":"静电效应对解读自组装单层膜 X 射线光发射光谱的重要性","authors":"Michael Zharnikov","doi":"10.1002/admi.202400595","DOIUrl":null,"url":null,"abstract":"This paper reviews the relevant work regarding electrostatic effects in X‐ray photoemission from self‐assembled monolayers (SAMs) which are application‐relevant ultrathin molecular films, coupled over a suitable anchoring group to the substrate. Whereas, in most cases, the standard concept of chemical shift is fully sufficient to describe X‐ray photoelectron spectra of these systems, consideration of electrostatic effects is frequently necessary for their proper interpretation. Due to the insulator character of the SAM matrix, decoupled electronically from the substrate, the introduction of a dipolar ´sheet´ at the SAM‐substrate interface or within this matrix creates a potential discontinuity shifting the energy levels above the ´sheet´ with respect to those below it. This shift is reflected then in the matrix‐related spectra, resulting in shifts and splitting of the characteristic photoemission peaks. Several representative examples in this context are provided and discussed in detail. These examples and other relevant literature data underline the importance of electrostatic effects in photoemission and suggest that they should be considered on the equal footing as the chemical shift ones.","PeriodicalId":115,"journal":{"name":"Advanced Materials Interfaces","volume":"7 1","pages":""},"PeriodicalIF":4.3000,"publicationDate":"2024-09-09","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Importance of Electrostatic Effects for Interpretation of X‐ray Photoemission Spectra of Self‐Assembled Monolayers\",\"authors\":\"Michael Zharnikov\",\"doi\":\"10.1002/admi.202400595\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"This paper reviews the relevant work regarding electrostatic effects in X‐ray photoemission from self‐assembled monolayers (SAMs) which are application‐relevant ultrathin molecular films, coupled over a suitable anchoring group to the substrate. Whereas, in most cases, the standard concept of chemical shift is fully sufficient to describe X‐ray photoelectron spectra of these systems, consideration of electrostatic effects is frequently necessary for their proper interpretation. Due to the insulator character of the SAM matrix, decoupled electronically from the substrate, the introduction of a dipolar ´sheet´ at the SAM‐substrate interface or within this matrix creates a potential discontinuity shifting the energy levels above the ´sheet´ with respect to those below it. This shift is reflected then in the matrix‐related spectra, resulting in shifts and splitting of the characteristic photoemission peaks. Several representative examples in this context are provided and discussed in detail. These examples and other relevant literature data underline the importance of electrostatic effects in photoemission and suggest that they should be considered on the equal footing as the chemical shift ones.\",\"PeriodicalId\":115,\"journal\":{\"name\":\"Advanced Materials Interfaces\",\"volume\":\"7 1\",\"pages\":\"\"},\"PeriodicalIF\":4.3000,\"publicationDate\":\"2024-09-09\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Advanced Materials Interfaces\",\"FirstCategoryId\":\"88\",\"ListUrlMain\":\"https://doi.org/10.1002/admi.202400595\",\"RegionNum\":3,\"RegionCategory\":\"材料科学\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q2\",\"JCRName\":\"CHEMISTRY, MULTIDISCIPLINARY\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Advanced Materials Interfaces","FirstCategoryId":"88","ListUrlMain":"https://doi.org/10.1002/admi.202400595","RegionNum":3,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"CHEMISTRY, MULTIDISCIPLINARY","Score":null,"Total":0}
引用次数: 0

摘要

自组装单层膜(SAMs)是与应用相关的超薄分子薄膜,通过适当的锚定基团与基底耦合,本文回顾了与自组装单层膜 X 射线光电子发射中的静电效应有关的工作。虽然在大多数情况下,标准的化学位移概念完全足以描述这些系统的 X 射线光电子能谱,但为了正确解释这些光谱,经常需要考虑静电效应。由于 SAM 矩阵具有绝缘体的特性,在电子上与基底脱钩,因此在 SAM-基底界面或在该矩阵中引入双极性 "薄片 "会产生电位不连续性,使 "薄片 "之上的能级相对于 "薄片 "之下的能级发生移动。这种移动反映在与基质相关的光谱中,导致特征光发射峰的移动和分裂。本文提供并详细讨论了这方面的几个代表性实例。这些例子和其他相关文献数据强调了静电效应在光发射中的重要性,并表明应将其与化学位移效应同等对待。
本文章由计算机程序翻译,如有差异,请以英文原文为准。

Importance of Electrostatic Effects for Interpretation of X‐ray Photoemission Spectra of Self‐Assembled Monolayers

Importance of Electrostatic Effects for Interpretation of X‐ray Photoemission Spectra of Self‐Assembled Monolayers
This paper reviews the relevant work regarding electrostatic effects in X‐ray photoemission from self‐assembled monolayers (SAMs) which are application‐relevant ultrathin molecular films, coupled over a suitable anchoring group to the substrate. Whereas, in most cases, the standard concept of chemical shift is fully sufficient to describe X‐ray photoelectron spectra of these systems, consideration of electrostatic effects is frequently necessary for their proper interpretation. Due to the insulator character of the SAM matrix, decoupled electronically from the substrate, the introduction of a dipolar ´sheet´ at the SAM‐substrate interface or within this matrix creates a potential discontinuity shifting the energy levels above the ´sheet´ with respect to those below it. This shift is reflected then in the matrix‐related spectra, resulting in shifts and splitting of the characteristic photoemission peaks. Several representative examples in this context are provided and discussed in detail. These examples and other relevant literature data underline the importance of electrostatic effects in photoemission and suggest that they should be considered on the equal footing as the chemical shift ones.
求助全文
通过发布文献求助,成功后即可免费获取论文全文。 去求助
来源期刊
Advanced Materials Interfaces
Advanced Materials Interfaces CHEMISTRY, MULTIDISCIPLINARY-MATERIALS SCIENCE, MULTIDISCIPLINARY
CiteScore
8.40
自引率
5.60%
发文量
1174
审稿时长
1.3 months
期刊介绍: Advanced Materials Interfaces publishes top-level research on interface technologies and effects. Considering any interface formed between solids, liquids, and gases, the journal ensures an interdisciplinary blend of physics, chemistry, materials science, and life sciences. Advanced Materials Interfaces was launched in 2014 and received an Impact Factor of 4.834 in 2018. The scope of Advanced Materials Interfaces is dedicated to interfaces and surfaces that play an essential role in virtually all materials and devices. Physics, chemistry, materials science and life sciences blend to encourage new, cross-pollinating ideas, which will drive forward our understanding of the processes at the interface. Advanced Materials Interfaces covers all topics in interface-related research: Oil / water separation, Applications of nanostructured materials, 2D materials and heterostructures, Surfaces and interfaces in organic electronic devices, Catalysis and membranes, Self-assembly and nanopatterned surfaces, Composite and coating materials, Biointerfaces for technical and medical applications. Advanced Materials Interfaces provides a forum for topics on surface and interface science with a wide choice of formats: Reviews, Full Papers, and Communications, as well as Progress Reports and Research News.
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
copy
已复制链接
快去分享给好友吧!
我知道了
右上角分享
点击右上角分享
0
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术官方微信