多主元素 Ti-Al-Zr-Mo-N 涂层中 Mo 含量增加对有序 N 空位的影响

IF 5.3 2区 材料科学 Q1 MATERIALS SCIENCE, COATINGS & FILMS
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引用次数: 0

摘要

多主元素氮化物(MPEN)是一种新兴的保护涂层替代材料,因其具有出色的摩擦机械性能而备受关注。然而,MPEN 涂层的操作响应取决于组成元素的选择和适当的成分比例,这将决定其最终的微观结构和形态。在此,我们报告了 Ti-Al-Zr-Mo-N 系统的 MPEN 溅射涂层的沉积情况,以及钼含量在 0 至 31.5 at.% 之间的微观结构和形态变化情况。相演化证明,当 Mo 含量较低时,主要是带有无序 N 空位的 B1(NaCl 型)结构,而当 Mo 含量较高时,主要是带有有序 N 空位的 β(四方)相,这种相演化导致涂层发生了显著的形态变化。此外,我们还发现 B1 相(无序 N 空位)和 β 相(有序 N 空位)混合涂层的摩擦机械性能最佳,这是由于每种相的纹理产生了协同效应。此外,还发现随着钼含量的增加,最佳抗腐蚀保护特性呈下降趋势。这些结果表明,有必要制定优化策略,以确定 MPEN 沉积过程中出现的各种现象(主要是由金属成分的性质及其原子比驱动的现象)的对立效应之间的平衡。目前的工作有助于根据保护涂层行业特定应用的预定相关特性设计、合成和优化 MPEN 涂层。
本文章由计算机程序翻译,如有差异,请以英文原文为准。

Effect of ordered N vacancies driven by increasing Mo content in multi-principal-element Ti-Al-Zr-Mo-N coatings

Effect of ordered N vacancies driven by increasing Mo content in multi-principal-element Ti-Al-Zr-Mo-N coatings

Multi-Principal-Element Nitrides (MPENs) are an emergent alternative gaining attention for protective coatings due to the promise of outstanding tribomechanical performance. However, the operational response of MPEN coatings depends on selecting constituent elements and determining proper composition ratios, which will determine their final microstructure and morphology. Herein, we report the deposition of MPEN sputtering coatings of the Ti-Al-Zr-Mo-N system following the microstructure and morphology behavior as a function of the variation of Mo from 0 to 31.5 at.%. The phase evolution evidences significant changes from a predominant B1 (NaCl-type) structure with disordered N vacancies for the lower Mo contents to a predominant β (tetragonal) phase with ordered N vacancies for the higher Mo contents, which leads to remarkable morphological changes in the coatings. In addition, we found the best tribomechanical performance in the coating with a mixture between B1 (disordered N vacancies) and β (ordered N vacancies), due to a synergistic effect based on the resultant texture in each phase. Furthermore, the best protective character against corrosion was found to have a decreasing trend as the Mo content increased. These results demonstrate the need for optimization strategies to determine the balance between opposing effects of phenomena that occur during the deposition of MPENs, mainly those driven by the nature of the metal constituents and their atomic ratio. The present work could contribute to the design, synthesis, and optimization of MPEN coatings based on predetermined properties of interest for specific applications of the protective coating industry.

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来源期刊
Surface & Coatings Technology
Surface & Coatings Technology 工程技术-材料科学:膜
CiteScore
10.00
自引率
11.10%
发文量
921
审稿时长
19 days
期刊介绍: Surface and Coatings Technology is an international archival journal publishing scientific papers on significant developments in surface and interface engineering to modify and improve the surface properties of materials for protection in demanding contact conditions or aggressive environments, or for enhanced functional performance. Contributions range from original scientific articles concerned with fundamental and applied aspects of research or direct applications of metallic, inorganic, organic and composite coatings, to invited reviews of current technology in specific areas. Papers submitted to this journal are expected to be in line with the following aspects in processes, and properties/performance: A. Processes: Physical and chemical vapour deposition techniques, thermal and plasma spraying, surface modification by directed energy techniques such as ion, electron and laser beams, thermo-chemical treatment, wet chemical and electrochemical processes such as plating, sol-gel coating, anodization, plasma electrolytic oxidation, etc., but excluding painting. B. Properties/performance: friction performance, wear resistance (e.g., abrasion, erosion, fretting, etc), corrosion and oxidation resistance, thermal protection, diffusion resistance, hydrophilicity/hydrophobicity, and properties relevant to smart materials behaviour and enhanced multifunctional performance for environmental, energy and medical applications, but excluding device aspects.
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