探索纳米结构镍薄膜随厚度变化的结构、化学和磁学特性

IF 3.8 2区 材料科学 Q2 MATERIALS SCIENCE, MULTIDISCIPLINARY
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引用次数: 0

摘要

使用电子束闪角沉积法在玻璃基底上沉积了不同厚度的镍薄膜。研究了薄膜在结构、化学和磁性方面的变化。所获得的形态和微观结构结果表明,沉积样品由垂直柱状组成,厚度在 50 纳米到 140 纳米之间,直径在 15 纳米到 29 纳米之间。随着薄膜厚度的增加,表面粗糙度也随之增加。化学分析显示,样品中的主要相为金属镍,并含有一定量的氧化镍。此外,磁性测量结果表明,所有镍薄膜都显示出典型的磁滞环,具有单轴磁各向异性。矫顽力随着厚度的增加而增加,最高可达 110 nm,随后进一步降低,这可能是由于柱体本身结构的差异,以及沉积纳米结构中产生的两种不同的反铁磁性(NiO)和铁磁性(Ni)相的共同作用。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Exploring thickness-dependent structural, chemical and magnetic properties of nanostructured nickel thin films

Nickel thin films were deposited to the different thicknesses onto glass substrates using electron-beam glancing angle deposition. The changes in the structural, chemical, and magnetic properties of the films have been investigated. The obtained morphological and microstructural results revealed that the deposited samples consisted of vertical columns with a thickness in the range of 50 nm to 140 nm and a diameter of 15 nm to 29 nm. With the increase in film thickness, the surface roughness increases as well. Chemical analysis showed that the main phase in the samples is metallic Ni, with a certain amount of NiO. In addition, magnetic measurements exhibit that all Ni films show typical hysteresis loops with a uniaxial magnetic anisotropy. The coercivity was found to increase with the thickness up to 110 nm followed by its further decrease, probably due to the differences in the structure of the columns themselves as well as the combined contributions of two different antiferromagnetic (NiO) and ferromagnetic (Ni) phases created in the deposited nanostructures.

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来源期刊
Vacuum
Vacuum 工程技术-材料科学:综合
CiteScore
6.80
自引率
17.50%
发文量
0
审稿时长
34 days
期刊介绍: Vacuum is an international rapid publications journal with a focus on short communication. All papers are peer-reviewed, with the review process for short communication geared towards very fast turnaround times. The journal also published full research papers, thematic issues and selected papers from leading conferences. A report in Vacuum should represent a major advance in an area that involves a controlled environment at pressures of one atmosphere or below. The scope of the journal includes: 1. Vacuum; original developments in vacuum pumping and instrumentation, vacuum measurement, vacuum gas dynamics, gas-surface interactions, surface treatment for UHV applications and low outgassing, vacuum melting, sintering, and vacuum metrology. Technology and solutions for large-scale facilities (e.g., particle accelerators and fusion devices). New instrumentation ( e.g., detectors and electron microscopes). 2. Plasma science; advances in PVD, CVD, plasma-assisted CVD, ion sources, deposition processes and analysis. 3. Surface science; surface engineering, surface chemistry, surface analysis, crystal growth, ion-surface interactions and etching, nanometer-scale processing, surface modification. 4. Materials science; novel functional or structural materials. Metals, ceramics, and polymers. Experiments, simulations, and modelling for understanding structure-property relationships. Thin films and coatings. Nanostructures and ion implantation.
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