通过低温高效涂层法改善金刚石/铜复合材料的界面

IF 2 4区 材料科学 Q3 MATERIALS SCIENCE, COATINGS & FILMS
Chenlong Wei , Xuexiang Wang , Jun Wen , Qiang Wang , Zhaoshi Donga
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引用次数: 0

摘要

偏钨酸铵在熔盐(NaCl+BaCl)环境中热分解形成的三氧化钨与金刚石表面的碳原子发生原位反应,形成了钨涂层。同时,利用制备的钨涂层金刚石制备了金刚石/铜复合材料。使用扫描电子显微镜、透射电子显微镜和能量色散光谱仪观察了涂层和金刚石/铜复合材料的形态和成分。结果表明,在 1050 ℃(比传统方法低 50-100 ℃)的低温盐浴处理后,原本光滑的金刚石表面被钨涂层均匀覆盖。与直接添加的三氧化钨相比,偏钨酸铵热分解产生的三氧化钨活性更高,涂层也更均匀。钨涂层金刚石/铜复合材料的抗弯强度和热导率分别为 280.6 MPa 和 516 W/(m-k),明显高于未涂层金刚石/铜复合材料(128.6 MPa 和 168 W/m-K)。这间接证实了金刚石表面涂层可以改善金刚石与铜的界面结合性能。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Interface improvement of diamond/copper composites through a low-temperature high-efficiency coating method

A tungsten coating was formed by the in situ reaction of tungsten trioxide formed by the thermal decomposition of ammonium metatungstate in a molten salt (NaCl+BaCl2) environment with carbon atoms on the surface of diamond. Meanwhile, diamond/copper composites were prepared using the prepared tungsten-coated diamonds. The morphology and composition of the coatings and diamond/copper composites were observed using scanning electron microscopy, transmission electron microscopy, and energy-dispersive spectroscopy. The results revealed that the originally smooth diamond surface was uniformly covered by a tungsten coating after low-temperature salt bath treatment at 1050 °C, a temperature 50–100 °C lower than that of traditional methods. Compared to the directly added tungsten trioxide, the tungsten trioxide produced by the thermal decomposition of ammonium metatungstate was more active, and the coating was more uniform. The bending strength and thermal conductivity of tungsten-coated diamond/copper composites were 280.6 MPa and 516 W/(m·k), respectively, which were significantly higher than those of uncoated diamond/copper composites (128.6 MPa and 168 W/m·K). This indirectly confirms that the diamond surface coating can improve the interfacial bonding performance between diamond and copper.

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来源期刊
Thin Solid Films
Thin Solid Films 工程技术-材料科学:膜
CiteScore
4.00
自引率
4.80%
发文量
381
审稿时长
7.5 months
期刊介绍: Thin Solid Films is an international journal which serves scientists and engineers working in the fields of thin-film synthesis, characterization, and applications. The field of thin films, which can be defined as the confluence of materials science, surface science, and applied physics, has become an identifiable unified discipline of scientific endeavor.
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