气相合成 MOF 薄膜

IF 1.7 4区化学

Bulletin of the Korean Chemical Society Pub Date : 2024-06-18 DOI:10.1002/bkcs.12854

Myeonggeun Choe, Hyeonwoo Lee, Hee Cheul Choi

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引用次数: 0

摘要

薄膜的制造是将有前途的新材料引入实用设备的最关键一步。在各种材料中，金属有机框架（MOF）薄膜以其多样化的应用优势受到广泛关注。在这篇综述中，我们将探讨两种具有代表性的气相合成方法：(1) 分子层沉积 (MLD)；(2) 化学气相沉积 (CVD)，它们都是新兴技术。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

Vapor-phase synthesis of MOF films

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Vapor-phase synthesis of MOF films

Fabrication of thin films is the most crucial step in introducing promising new materials into practical devices. Among the various materials, metal–organic framework (MOF) thin films have gained widespread attention with the advantage of diverse applications. In this review, two representative vapor-phase synthetic methods, (1) molecular layer deposition (MLD), (2) chemical vapor deposition (CVD) are addressed as emerging techniques.

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来源期刊

Bulletin of the Korean Chemical Society Chemistry-General Chemistry

自引率

23.50%

发文量

182

期刊介绍： The Bulletin of the Korean Chemical Society is an official research journal of the Korean Chemical Society. It was founded in 1980 and reaches out to the chemical community worldwide. It is strictly peer-reviewed and welcomes Accounts, Communications, Articles, and Notes written in English. The scope of the journal covers all major areas of chemistry: analytical chemistry, electrochemistry, industrial chemistry, inorganic chemistry, life-science chemistry, macromolecular chemistry, organic synthesis, non-synthetic organic chemistry, physical chemistry, and materials chemistry.