倾斜表面浮雕成像的层析成像技术

IF 0.5 Q4 PHYSICS, CONDENSED MATTER
N. L. Popov, I. A. Artyukov, A. V. Vinogradov
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引用次数: 0

摘要

摘要 如今,层析成像被认为是接近光学分辨率衍射极限的最自然、最有效的方法。层析成像仪的主要方案不包含折射或聚焦元件,它包括一个相干光源、一个移动(宏观)物体的平台、一个用于记录穿过物体或由物体反射的辐射的探测器以及一台用于处理衍射图样的计算机。在传统光学中,实现高空间分辨率的主要任务是校正和消除光学系统的像差,而在拼版摄影中,空间分辨率主要取决于大数值孔径衍射图样的登记和计算机处理的可靠性。分色摄影技术的主要理念是通过计算机处理重叠的衍射图样(扫描)来获得图像。在移动物体时,假定照明光束和探测器的位置保持不变。层析成像技术可用于从红外线到 X 射线的各种辐射波长,而且可以不使用成像光学器件。在这项工作中,研究了获得与入射光线倾斜的物体表面浮雕的振幅相位图像的可能性。
本文章由计算机程序翻译,如有差异,请以英文原文为准。

Ptychography for Imaging Relief of Inclined Surfaces

Ptychography for Imaging Relief of Inclined Surfaces

Ptychography for Imaging Relief of Inclined Surfaces

Ptychography today is considered the most natural and effective method for approaching the diffraction limit of optical resolution. The principal scheme of a ptychoscope does not contain refractive or focusing elements and includes a coherent light source, a platform for moving (macroscopic) object, and a detector for registering radiation passed through or reflected by the object associated with a computer for processing diffraction patterns. In classical optics, the main task in achieving high spatial resolution is the correction and elimination of aberrations of optical systems, while in ptychography spatial resolution mainly depends on the reliability of registration and computer processing of diffraction patterns with large numerical apertures. The key idea of ptychography is to obtain an image by computer processing of overlapping diffraction patterns (scans). When moving the object it is assumed that the illuminating beam and the position of the detector remain unchanged. Ptychography is used in a wide range of radiation wavelengths from infrared to X-ray, and it is possible to do without imaging optics. In this work, the possibility of obtaining an amplitude-phase image of the surface relief of an object inclined to the incident one was studied.

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来源期刊
CiteScore
0.90
自引率
25.00%
发文量
144
审稿时长
3-8 weeks
期刊介绍: Journal of Surface Investigation: X-ray, Synchrotron and Neutron Techniques publishes original articles on the topical problems of solid-state physics, materials science, experimental techniques, condensed media, nanostructures, surfaces of thin films, and phase boundaries: geometric and energetical structures of surfaces, the methods of computer simulations; physical and chemical properties and their changes upon radiation and other treatments; the methods of studies of films and surface layers of crystals (XRD, XPS, synchrotron radiation, neutron and electron diffraction, electron microscopic, scanning tunneling microscopic, atomic force microscopic studies, and other methods that provide data on the surfaces and thin films). Articles related to the methods and technics of structure studies are the focus of the journal. The journal accepts manuscripts of regular articles and reviews in English or Russian language from authors of all countries. All manuscripts are peer-reviewed.
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