{"title":"论 (001) 镍面溅射 MD 模型中溅射原子极角分布最大值的移动","authors":"A. I. Musin, V. N. Samoilov","doi":"10.1134/S1027451024700253","DOIUrl":null,"url":null,"abstract":"<p>Using an up-to-date full molecular dynamics model of sputtering of single crystals and taking into account the incidence of ions on the surface, the peculiarities and mechanisms of atom sputtering during bombardment of the (001) Ni face with 200 eV Ar ions are studied for two target temperatures. It is shown for the first time that with an increase in the energy of sputtered atoms not only the maximum of their polar angular distribution in the azimuthal direction toward the Wehner spots but also the maximum of the polar angular distribution integrated over the azimuthal angles shifts first toward the normal to the surface and then in the opposite direction. The polar distribution integrated over the azimuthal angles is formed by atoms ejecting from the surface at much larger polar angles than that in the final (observed) distribution. Both effects are explained in terms of the surface mechanism of single crystal sputtering.</p>","PeriodicalId":671,"journal":{"name":"Journal of Surface Investigation: X-ray, Synchrotron and Neutron Techniques","volume":"18 3","pages":"648 - 653"},"PeriodicalIF":0.5000,"publicationDate":"2024-07-15","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"On the Shift of the Maximum of the Polar Angular Distribution of Sputtered Atoms in the MD Model of the (001) Ni Face Sputtering\",\"authors\":\"A. I. Musin, V. N. Samoilov\",\"doi\":\"10.1134/S1027451024700253\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"<p>Using an up-to-date full molecular dynamics model of sputtering of single crystals and taking into account the incidence of ions on the surface, the peculiarities and mechanisms of atom sputtering during bombardment of the (001) Ni face with 200 eV Ar ions are studied for two target temperatures. It is shown for the first time that with an increase in the energy of sputtered atoms not only the maximum of their polar angular distribution in the azimuthal direction toward the Wehner spots but also the maximum of the polar angular distribution integrated over the azimuthal angles shifts first toward the normal to the surface and then in the opposite direction. The polar distribution integrated over the azimuthal angles is formed by atoms ejecting from the surface at much larger polar angles than that in the final (observed) distribution. Both effects are explained in terms of the surface mechanism of single crystal sputtering.</p>\",\"PeriodicalId\":671,\"journal\":{\"name\":\"Journal of Surface Investigation: X-ray, Synchrotron and Neutron Techniques\",\"volume\":\"18 3\",\"pages\":\"648 - 653\"},\"PeriodicalIF\":0.5000,\"publicationDate\":\"2024-07-15\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Journal of Surface Investigation: X-ray, Synchrotron and Neutron Techniques\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://link.springer.com/article/10.1134/S1027451024700253\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q4\",\"JCRName\":\"PHYSICS, CONDENSED MATTER\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Journal of Surface Investigation: X-ray, Synchrotron and Neutron Techniques","FirstCategoryId":"1085","ListUrlMain":"https://link.springer.com/article/10.1134/S1027451024700253","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q4","JCRName":"PHYSICS, CONDENSED MATTER","Score":null,"Total":0}
引用次数: 0
摘要
摘要 利用最新的单晶体溅射全分子动力学模型，并考虑到离子在表面的入射情况，研究了 200 eV Ar 离子轰击 (001) Ni 面时，在两个靶温度下原子溅射的特性和机制。研究首次表明，随着溅射原子能量的增加，不仅其极角分布在方位角方向上的最大值朝向韦纳光斑，而且极角分布在方位角上的最大值首先朝向表面的法线，然后朝相反方向移动。方位角上的极角分布是由从表面喷出的原子形成的，其极角比最终（观测到的）分布的极角要大得多。这两种效应都可以用单晶溅射的表面机制来解释。
On the Shift of the Maximum of the Polar Angular Distribution of Sputtered Atoms in the MD Model of the (001) Ni Face Sputtering
Using an up-to-date full molecular dynamics model of sputtering of single crystals and taking into account the incidence of ions on the surface, the peculiarities and mechanisms of atom sputtering during bombardment of the (001) Ni face with 200 eV Ar ions are studied for two target temperatures. It is shown for the first time that with an increase in the energy of sputtered atoms not only the maximum of their polar angular distribution in the azimuthal direction toward the Wehner spots but also the maximum of the polar angular distribution integrated over the azimuthal angles shifts first toward the normal to the surface and then in the opposite direction. The polar distribution integrated over the azimuthal angles is formed by atoms ejecting from the surface at much larger polar angles than that in the final (observed) distribution. Both effects are explained in terms of the surface mechanism of single crystal sputtering.
期刊介绍：
Journal of Surface Investigation: X-ray, Synchrotron and Neutron Techniques publishes original articles on the topical problems of solid-state physics, materials science, experimental techniques, condensed media, nanostructures, surfaces of thin films, and phase boundaries: geometric and energetical structures of surfaces, the methods of computer simulations; physical and chemical properties and their changes upon radiation and other treatments; the methods of studies of films and surface layers of crystals (XRD, XPS, synchrotron radiation, neutron and electron diffraction, electron microscopic, scanning tunneling microscopic, atomic force microscopic studies, and other methods that provide data on the surfaces and thin films). Articles related to the methods and technics of structure studies are the focus of the journal. The journal accepts manuscripts of regular articles and reviews in English or Russian language from authors of all countries. All manuscripts are peer-reviewed.
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