通过电子束诱导氧化实现纳米级表面封闭相分离

IF 5.8 3区材料科学 Q1 CHEMISTRY, MULTIDISCIPLINARY

Nanoscale Pub Date : 2024-06-24 DOI:10.1039/d4nr01650e

Sven Barth, Fabrizio Porrati, Daniel Knez, Felix Jungwirth, Nicolas Paul Jochmann, Michael Huth, Robert Winkler, Harald Plank, Isabel Gracia, Carles Cane

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引用次数: 0

摘要

研究表明，在厚度小于 10 nm 的电绝缘氧化硅层上形成 2-4 nm 的金属氧化物表面层时，会发生基于 Co-Si 的聚焦电子束诱导沉积（FEBID）材料的电子诱导氧化。图解了热氧化和电子诱导氧化对所产生的微观结构的影响。

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Nanoscale, surface-confined phase separation by electron beam induced oxidation

Electron-induced oxidation of Co-Si-based focused electron beam induced deposition (FEBID) materials is shown to form a 2-4 nm metal oxide surface layer on top of an electrically insulating silicon oxide layer less than 10 nm thick. Differences between thermal and electron-induced oxidation on the resulting microstructure are illustrated.

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来源期刊

Nanoscale CHEMISTRY, MULTIDISCIPLINARY-NANOSCIENCE & NANOTECHNOLOGY

CiteScore

12.10

自引率

3.00%

发文量

1628

审稿时长

1.6 months

期刊介绍： Nanoscale is a high-impact international journal, publishing high-quality research across nanoscience and nanotechnology. Nanoscale publishes a full mix of research articles on experimental and theoretical work, including reviews, communications, and full papers.Highly interdisciplinary, this journal appeals to scientists, researchers and professionals interested in nanoscience and nanotechnology, quantum materials and quantum technology, including the areas of physics, chemistry, biology, medicine, materials, energy/environment, information technology, detection science, healthcare and drug discovery, and electronics.