高密度半经典等离子体下正电子-氢散射中的电子俘获动力学

IF 1.3 4区 物理与天体物理 Q3 PHYSICS, FLUIDS & PLASMAS
Kamalika Das, Netai Das, Arijit Ghoshal
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引用次数: 0

摘要

我们从理论上研究了致密半经典等离子体(DSCP)环境下-H(1 s)散射中电子俘获的散射动力学。通过保留+H(1 s)和p+Ps(1 s)通道,求解了多通道双体李普曼-施温格耦合方程,计算了中高入射能量下电子俘获过程的截面(CS)。等离子体带电粒子的有效相互作用是通过伪势来模拟的,而伪势是等离子体屏蔽强度和德布罗意波长这两个参数的函数。详细研究探讨了上述过程中 CSs 随等离子体屏蔽强度和 de Broglie 波长变化而发生的变化。研究发现,当屏蔽强度和德布罗意波长发生变化时,CS 会发生显著变化。具体来说,在给定的屏蔽强度下,随着德布罗意波长的增加,差分 CS 的急剧最小值向正向移动。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Dynamics of electron capture in positron-hydrogen scattering under dense semi-classical plasmas

The scattering dynamics of electron capture in e + $$ {\mathrm{e}}^{+} $$ -H(1 s) scattering under dense semi-classical plasma (DSCP) environments has been investigated theoretically. Coupled multi-channel two-body Lippmann-Schwinger equations have been solved by retaining e + $$ {\mathrm{e}}^{+} $$ +H(1 s) and p + Ps(1 s) channels to calculate the cross sections (CS) of the electron capture process at intermediate and high incident energies. The effective interaction of the plasma charged particles is modelled by a pseudopotential which is a function of two parameters, namely the plasma screening strength and the de Broglie wavelength. A detailed study is made to explore the changes in the CSs of the above-mentioned process with respect to the variation in the plasma screening strength and de Broglie wavelength. Significant changes are found to take place, when the screening strength and the de Broglie wavelength are varied. Specifically, the sharp minimum in the differential CS moves toward the forward direction with increasing de Broglie wavelength at a given screening strength.

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来源期刊
Contributions to Plasma Physics
Contributions to Plasma Physics 物理-物理:流体与等离子体
CiteScore
2.90
自引率
12.50%
发文量
110
审稿时长
4-8 weeks
期刊介绍: Aims and Scope of Contributions to Plasma Physics: Basic physics of low-temperature plasmas; Strongly correlated non-ideal plasmas; Dusty Plasmas; Plasma discharges - microplasmas, reactive, and atmospheric pressure plasmas; Plasma diagnostics; Plasma-surface interaction; Plasma technology; Plasma medicine.
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