聚对二甲苯-硫化镉纳米复合薄膜的结构特征

IF 0.5 Q4 PHYSICS, CONDENSED MATTER
O. P. Ivanova, A. V. Krivandin, A. A. Piryazev, S. A. Zav’yalov
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引用次数: 0

摘要

摘要 利用 X 射线衍射和红外光谱研究了以硫化镉(CdS)为填料的聚对二甲苯纳米复合薄膜的结构和化学成分。这些薄膜是通过对二甲苯单体和 CdS 蒸汽在石英和硅基底上共沉积合成的,厚度分别为 ~0.2 和 ~1.5 µm,CdS 含量为 5-90 vol %。研究证明了填料含量和薄膜厚度对聚合物基体和填料结构的影响。厚度为 ~0.2 和 ~1.5 µm 的薄膜的化学成分存在差异,这是由于它们在合成后与空气接触时部分氧化所致。讨论了羟基对薄膜中 CdS 晶体结构形成的可能影响。对于厚度约为 0.2 μm 的薄膜,CdS 含量变化时的结构转变与之前获得的暗电导率和光电导率的相关性已经建立起来。
本文章由计算机程序翻译,如有差异,请以英文原文为准。

Structural Features of Poly(p-Xylylene)−Cadmium Sulfide Nanocomposite Films

Structural Features of Poly(p-Xylylene)−Cadmium Sulfide Nanocomposite Films

Structural Features of Poly(p-Xylylene)−Cadmium Sulfide Nanocomposite Films

The structure and chemical composition of nanocomposite films based on poly(p-xylylene) with cadmium sulfide (CdS) as a filler were studied by X-ray diffraction and infrared (IR) spectroscopy. The films were synthesized by the codeposition of p-xylylene monomer and CdS vapors on quartz and silicon substrates, had a thickness of ~0.2 and ~1.5 µm and contained 5–90 vol % of CdS. The effect of the filler content and film thickness on polymer matrix and filler structure was demonstrated. The differences in the chemical compositions of the films with thicknesses of ~0.2 and ~1.5 µm were revealed, caused by their partial oxidation upon contact with air after synthesis. The possible influence of hydroxyl groups on the formation of CdS crystalline structures in films was discussed. A correlation was established between the structural transformations upon changes in the CdS content with the previously obtained dependences of the dark conductivity and photoconductivity for films with a thickness of ~0.2 μm.

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来源期刊
CiteScore
0.90
自引率
25.00%
发文量
144
审稿时长
3-8 weeks
期刊介绍: Journal of Surface Investigation: X-ray, Synchrotron and Neutron Techniques publishes original articles on the topical problems of solid-state physics, materials science, experimental techniques, condensed media, nanostructures, surfaces of thin films, and phase boundaries: geometric and energetical structures of surfaces, the methods of computer simulations; physical and chemical properties and their changes upon radiation and other treatments; the methods of studies of films and surface layers of crystals (XRD, XPS, synchrotron radiation, neutron and electron diffraction, electron microscopic, scanning tunneling microscopic, atomic force microscopic studies, and other methods that provide data on the surfaces and thin films). Articles related to the methods and technics of structure studies are the focus of the journal. The journal accepts manuscripts of regular articles and reviews in English or Russian language from authors of all countries. All manuscripts are peer-reviewed.
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