Indrani Mishra, Shalik R. Joshi, Subrata Majumder, Shikha Varma
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引用次数: 0
摘要
在这里,我们研究了经过 3 keV Ar 离子照射的硅表面的粗化行为、缩放特性和润湿性。这些表面说明了纳米...
Exploring wetting & scaling behavior of rough silicon surfaces
Here we study the roughening behavior, scaling properties and the wetting nature of the Silicon surfaces that have been irradiated with 3 keV Ar ions. These surfaces illustrate the formation of nan...
期刊介绍:
The Journal covers a wide range of topics under radiation and plasma sciences. The range of contributions encompasses: radiation physics; radiochemistry, radiobiology and physical effects of medical irradiation, including research on radiative cell degeneration; optical, electrical and mechanical effects of radiation, and their secondary effects such as diffusion and particle emission from surfaces; plasma techniques and plasma phenomena. On plasma science the Journal covers all areas of fusion, space and low temperature plasmas.