水覆盖表面的电荷转移:铜和硅案例的进展报告

IF 1.1 4区 物理与天体物理 Q3 NUCLEAR SCIENCE & TECHNOLOGY
Shenshen Hou, Bin Ding, Wenhao Su, Quan Wu, Yibin Mao, Rongliang Zhang, Ding Ma, Lin Chen, Yanling Guo, Ximeng Chen, Vladimir A. Esaulov
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引用次数: 0

摘要

水与表面的吸附和反应在催化和腐蚀方面具有极其重要的意义。离子散射的电荷转移对功函数和电子稳定性的变化非常敏感。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Charge transfer on water covered surfaces: a progress report for the case of Cu & Si
The adsorption and reactions of water with surfaces is of immense importance in catalysis and corrosion. Charge transfer of ion scattering is sensitive to changes of work function and electronic st...
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来源期刊
CiteScore
1.60
自引率
20.00%
发文量
107
审稿时长
4 months
期刊介绍: The Journal covers a wide range of topics under radiation and plasma sciences. The range of contributions encompasses: radiation physics; radiochemistry, radiobiology and physical effects of medical irradiation, including research on radiative cell degeneration; optical, electrical and mechanical effects of radiation, and their secondary effects such as diffusion and particle emission from surfaces; plasma techniques and plasma phenomena. On plasma science the Journal covers all areas of fusion, space and low temperature plasmas.
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