交流电频率对中空磁控溅射放电参数的影响

Zahraa Mohammed Hasan, Q. A. Abbas
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引用次数: 0

摘要

本研究利用光发射光谱诊断了交流电源频率对空心磁控溅射放电参数(如放电发射、放电电流和电压、辉光放电结构、温度(Te)和电子数密度(ne)、德拜长度(λD)以及恒压等离子体参数(ND))的影响。电子温度和电子数密度分别用玻尔兹曼图和斯塔克展宽法测定。结果表明,正常辉光放电结构与直流放电模式相似。磁场对所研究的两种 A.C. 频率的基本放电参数没有影响。另一方面,在两种放电频率下,其他放电参数(Te、ne、λD 和 ND)随着磁场的增加而增加。此外,交流源电流频率的增加也会导致放电强度发射和其他放电参数的增加。在这种情况下,频率为 7 kHz 时,Te 从 0.685 eV 猛增到 0.839 eV,ne 从 3.088 x 1018 m-3 增加到 4.902 x 1018 m-3。频率为 9 kHz 时,电子温度从 0.711eV 上升到 0.911 eV,氖从 3.615 x 1018 m-3 上升到 6.749 x 1018 m-3。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Influence of A.C. Frequency on Hollow Magnetron Sputtering Discharge Parameters
In the present work, optical emission spectroscopy was used to diagnose the influence of A.C. power source frequency on the hollow magnetron sputtering discharge parameters (such as discharge emission, discharge current and voltage, glow discharge structure, temperature (Te) and electron number density (ne), Debye length (λD), and plasma parameter (ND) of constant pressure. The electron temperature and number density were determined using the Boltzmann plots and the Stark broadening methods, respectively. The results illustrate that the normal glow discharge structure is similar to the D.C. discharge mode. The magnetic field has no impact on the fundamental discharge parameter in both A.C. frequencies under study. On the other hand, the other discharge parameters (Te, ne, λD and ND) increase with increasing the magnetic field in both discharge frequencies. In addition, the increase in the frequency of the A.C. source current led to an increase in the discharge intensity emission and the other discharge parameters being studied. In this case, in frequency 7 kHz, Te surged from 0.685 eV to 0.839 eV, and ne experienced an increase from 3.088 x 1018 m-3 to 4.902 x 1018 m-3. At a frequency of 9 kHz, the electron temperature surged from 0.711eV to 0.911 eV. ne experienced an increase from 3.615 x 1018 m-3 to 6.749 x 1018 m-3.
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