{"title":"光刻光学技术向先进的超紫外光刻发展：让摩尔定律延续六十年","authors":"Winfried Kaiser","doi":"10.1109/MED.2023.3343627","DOIUrl":null,"url":null,"abstract":"EUV is currently the state-of-the-art lithography technology used to print the most critical layers of ICs, specifically of advanced logic and DRAM. It represents the highest achievement in the industry after decades of development of optical lithography.","PeriodicalId":491767,"journal":{"name":"IEEE Electron Devices Magazine","volume":"17 1","pages":"23-34"},"PeriodicalIF":0.0000,"publicationDate":"2024-03-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":"{\"title\":\"The Evolvement of Lithography Optics Towards Advanced EUV Lithography: Enabling the Continuation of Moore’s Law for Six Decades\",\"authors\":\"Winfried Kaiser\",\"doi\":\"10.1109/MED.2023.3343627\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"EUV is currently the state-of-the-art lithography technology used to print the most critical layers of ICs, specifically of advanced logic and DRAM. It represents the highest achievement in the industry after decades of development of optical lithography.\",\"PeriodicalId\":491767,\"journal\":{\"name\":\"IEEE Electron Devices Magazine\",\"volume\":\"17 1\",\"pages\":\"23-34\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2024-03-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"1\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"IEEE Electron Devices Magazine\",\"FirstCategoryId\":\"0\",\"ListUrlMain\":\"https://doi.org/10.1109/MED.2023.3343627\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"IEEE Electron Devices Magazine","FirstCategoryId":"0","ListUrlMain":"https://doi.org/10.1109/MED.2023.3343627","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
The Evolvement of Lithography Optics Towards Advanced EUV Lithography: Enabling the Continuation of Moore’s Law for Six Decades
EUV is currently the state-of-the-art lithography technology used to print the most critical layers of ICs, specifically of advanced logic and DRAM. It represents the highest achievement in the industry after decades of development of optical lithography.
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