用于光电子应用的玻璃上溶胶-凝胶旋涂透明单二氧化钛和二氧化硅薄膜

Q4 Chemistry
S. Sigamani, M.V. Someswararao, V. Swaminatham
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引用次数: 0

摘要

溶胶-凝胶合成和旋涂沉积技术在制造各种薄膜方面受到了极大的关注。因为使用四乙基正硅酸盐和异丙醇钛前驱体制造电介质(金属氧化物)薄膜的技术非常简单。在这项工作中,在玻璃基底上沉积了透明的单层 SiO2 和 TiO2 薄膜,并通过傅立叶变换红外光谱、紫外可见光谱、荧光和扫描电子显微镜技术对其进行了表征。单层薄膜附着在玻璃基底上,具有机械稳定性和强度。傅立叶变换红外透射光谱表明,在 ~1100 和 1400 cm-1 处存在着 Si-O-Si 和 Ti-O-Ti 。单层 SiO2 和 TiO2 薄膜的紫外-可见吸收光谱在 00 nm 以下有很强的吸收。激发波长为 380 nm,两种薄膜的荧光光谱都在 733-798 nm 之间显示出最高的发射光谱。扫描电镜研究证实,二氧化硅和二氧化钛层的表面都很光滑。此外,它还可用于太阳能电池的背反射器、抗反射涂层、疏水和防雾材料等多种用途。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Sol-Gel Spin Coated Transparent Single-TiO2 and SiO2 Thin Film on Glass for Opto-electronic Applications
Great attention has been given on the sol-gel synthesis and spin-coating deposition techniques for the fabrication of various thin films. Because of its simple technique to fabricate dielectric (metal oxide) films using tetraethyl orthosilicate and titanium isopropoxide precursors. In this work, transparent single layer of SiO2 and TiO2 thin film was deposited on a glass substrate and characterized by  FTIR, UV-visible spectroscopy, fluorescence and scanning electron microscopy techniques. The single layer thin film was mechanically  stable and strong by adhering to glass substrates. The FTIR transmittance spectrum evidenced the existence of Si-O-Si and Ti-O-Ti at  ~1100 and 1400 cm-1. The UV-visible absorbance spectra of single layer of SiO2 and TiO2 thin films showed strong absorption at below  00 nm. The excitation wavelength at 380 nm, the fluorescence spectra of both thin films showed the highest emission spectrum  in between 733-798 nm. The SEM studies confirmed the smooth surface in both SiO2 and TiO2 layers. Further, it could be useful for  various applications such as back reflector in solar cells, anti-reflection coatings, hydrophobic and anti-fogging materials. 
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来源期刊
Asian Journal of Chemistry
Asian Journal of Chemistry 化学-化学综合
CiteScore
0.80
自引率
0.00%
发文量
229
审稿时长
4 months
期刊介绍: Information not localized
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