从液态镓靶溅射出的变性 n-GaN 的低场传输特性和散射机制

P. Döring, T. Tschirky
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引用次数: 0

摘要

在这项工作中,我们展示了通过液态镓靶共溅射制备的退变型 n 型氮化镓薄膜,并描述了其低场散射机制。在低工艺温度(< 800 °C)下,实现了高于 3×1020 cm-3 的极高供体浓度,比电阻率低于 0.5 mΩcm。通过随温度变化的霍尔测量(300-550 K)验证了溅射薄膜的退变性,结果显示电子迁移率和供体浓度的变化可以忽略不计。电离杂质的散射被确定为主要的限制因素,在高温下极性光-声子散射的贡献较小。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Low-field transport properties and scattering mechanisms of degenerate n-GaN by sputtering from a liquid Ga-target
In this work, degenerate n-type GaN thin films prepared by co-sputtering from a liquid Ga-target were demonstrated and their low field scattering mechanisms described. Extremely high donor concentrations above 3×1020 cm-3 at low process temperatures (< 800 °C) with specific resistivities below 0.5 mΩcm were achieved. The degenerate nature of the sputtered films was verified via temperature-dependent Hall-measurements (300-550 K) revealing negligible change in electron mobility and donor concentration. Scattering at ionized impurities was determined to be the major limiting factor with a minor contribution of polar optical-phonon scattering at high temperatures.
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