Pd-表面氧化-InP 结构的层叠阻抗不稳定性

IF 0.8 4区物理与天体物理 Q4 PHYSICS, APPLIED

Technical Physics Letters Pub Date : 2024-03-13 DOI:10.1134/s1063785023900352

M. E. Kompan, A. V. Gorbatyuk, V. G. Malyshkin, V. A. Shutaev, E. A. Grebenshchikova, Yu. P. Yakovlev

{"title":"Pd-表面氧化-InP 结构的层叠阻抗不稳定性","authors":"M. E. Kompan, A. V. Gorbatyuk, V. G. Malyshkin, V. A. Shutaev, E. A. Grebenshchikova, Yu. P. Yakovlev","doi":"10.1134/s1063785023900352","DOIUrl":null,"url":null,"abstract":"<h3 data-test=\"abstract-sub-heading\">Abstract</h3><p>Multiple instability was found on the volt–ampere characteristic of the palladium-surface-oxidized indium phosphide structure. The effect is recorded when recording the dependence of differential conductivity and differential capacitance on the applied external voltage. A mechanism for the appearance of instabilities is proposed.</p>","PeriodicalId":784,"journal":{"name":"Technical Physics Letters","volume":null,"pages":null},"PeriodicalIF":0.8000,"publicationDate":"2024-03-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Cascade of Impedance Instabilities of the Structure Pd-Surface-Oxidized-InP\",\"authors\":\"M. E. Kompan, A. V. Gorbatyuk, V. G. Malyshkin, V. A. Shutaev, E. A. Grebenshchikova, Yu. P. Yakovlev\",\"doi\":\"10.1134/s1063785023900352\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"<h3 data-test=\\\"abstract-sub-heading\\\">Abstract</h3><p>Multiple instability was found on the volt–ampere characteristic of the palladium-surface-oxidized indium phosphide structure. The effect is recorded when recording the dependence of differential conductivity and differential capacitance on the applied external voltage. A mechanism for the appearance of instabilities is proposed.</p>\",\"PeriodicalId\":784,\"journal\":{\"name\":\"Technical Physics Letters\",\"volume\":null,\"pages\":null},\"PeriodicalIF\":0.8000,\"publicationDate\":\"2024-03-13\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Technical Physics Letters\",\"FirstCategoryId\":\"101\",\"ListUrlMain\":\"https://doi.org/10.1134/s1063785023900352\",\"RegionNum\":4,\"RegionCategory\":\"物理与天体物理\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q4\",\"JCRName\":\"PHYSICS, APPLIED\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Technical Physics Letters","FirstCategoryId":"101","ListUrlMain":"https://doi.org/10.1134/s1063785023900352","RegionNum":4,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q4","JCRName":"PHYSICS, APPLIED","Score":null,"Total":0}

引用次数: 0

摘要

摘要在钯表面氧化磷化铟结构的伏安特性上发现了多重不稳定性。在记录差分电导率和差分电容与外加电压的关系时，记录到了这种效应。提出了出现不稳定性的机理。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

Cascade of Impedance Instabilities of the Structure Pd-Surface-Oxidized-InP

查看原文本刊更多论文

Cascade of Impedance Instabilities of the Structure Pd-Surface-Oxidized-InP

Abstract

Multiple instability was found on the volt–ampere characteristic of the palladium-surface-oxidized indium phosphide structure. The effect is recorded when recording the dependence of differential conductivity and differential capacitance on the applied external voltage. A mechanism for the appearance of instabilities is proposed.

求助全文

通过发布文献求助，成功后即可免费获取论文全文。去求助

来源期刊

Technical Physics Letters 物理-物理：应用

CiteScore

1.50

自引率

0.00%

发文量

审稿时长

2-4 weeks

期刊介绍： Technical Physics Letters is a companion journal to Technical Physics and offers rapid publication of developments in theoretical and experimental physics with potential technological applications. Recent emphasis has included many papers on gas lasers and on lasing in semiconductors, as well as many reports on high Tc superconductivity. The excellent coverage of plasma physics seen in the parent journal, Technical Physics, is also present here with quick communication of developments in theoretical and experimental work in all fields with probable technical applications. Topics covered are basic and applied physics; plasma physics; solid state physics; physical electronics; accelerators; microwave electron devices; holography.