封面图片：Contrib.等离子体物理 02/2024

IF 1.3 4区物理与天体物理 Q3 PHYSICS, FLUIDS & PLASMAS

Contributions to Plasma Physics Pub Date : 2024-02-16 DOI:10.1002/ctpp.876

{"title":"封面图片：Contrib.等离子体物理 02/2024","authors":"","doi":"10.1002/ctpp.876","DOIUrl":null,"url":null,"abstract":"<p>PIV images of a dusty plasma (obtained after averaging 50 images) flow in a horizontal plane at different vertical locations of confined dust grains in a potential well. (a) Topmost dust grains (b) 2mm below the topmost dust grains plane, (c) 4mm lower than the topmost dust grains plane, (d) 6mm lower than the topmost dust grains plane. Fig. 5 of the paper by Mangilal Choudhary. https://doi.org/10.1002/ctpp.202300072\n \n <figure>\n <div><picture>\n <source></source></picture><p></p>\n </div>\n </figure></p>","PeriodicalId":10700,"journal":{"name":"Contributions to Plasma Physics","volume":"64 2","pages":""},"PeriodicalIF":1.3000,"publicationDate":"2024-02-16","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://onlinelibrary.wiley.com/doi/epdf/10.1002/ctpp.876","citationCount":"0","resultStr":"{\"title\":\"Cover Picture: Contrib. Plasma Phys. 02/2024\",\"authors\":\"\",\"doi\":\"10.1002/ctpp.876\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"<p>PIV images of a dusty plasma (obtained after averaging 50 images) flow in a horizontal plane at different vertical locations of confined dust grains in a potential well. (a) Topmost dust grains (b) 2mm below the topmost dust grains plane, (c) 4mm lower than the topmost dust grains plane, (d) 6mm lower than the topmost dust grains plane. Fig. 5 of the paper by Mangilal Choudhary. https://doi.org/10.1002/ctpp.202300072\\n \\n <figure>\\n <div><picture>\\n <source></source></picture><p></p>\\n </div>\\n </figure></p>\",\"PeriodicalId\":10700,\"journal\":{\"name\":\"Contributions to Plasma Physics\",\"volume\":\"64 2\",\"pages\":\"\"},\"PeriodicalIF\":1.3000,\"publicationDate\":\"2024-02-16\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"https://onlinelibrary.wiley.com/doi/epdf/10.1002/ctpp.876\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Contributions to Plasma Physics\",\"FirstCategoryId\":\"101\",\"ListUrlMain\":\"https://onlinelibrary.wiley.com/doi/10.1002/ctpp.876\",\"RegionNum\":4,\"RegionCategory\":\"物理与天体物理\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q3\",\"JCRName\":\"PHYSICS, FLUIDS & PLASMAS\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Contributions to Plasma Physics","FirstCategoryId":"101","ListUrlMain":"https://onlinelibrary.wiley.com/doi/10.1002/ctpp.876","RegionNum":4,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q3","JCRName":"PHYSICS, FLUIDS & PLASMAS","Score":null,"Total":0}

引用次数: 0

摘要

含尘等离子体在电位井中受限尘粒不同垂直位置的水平面内流动的 PIV 图像（50 幅图像平均后获得）。(a）最顶端尘粒；（b）最顶端尘粒平面下方 2 毫米；（c）比最顶端尘粒平面低 4 毫米；（d）比最顶端尘粒平面低 6 毫米。Mangilal Choudhary 论文中的图 5。https://doi.org/10.1002/ctpp.202300072。

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Cover Picture: Contrib. Plasma Phys. 02/2024

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Cover Picture: Contrib. Plasma Phys. 02/2024

PIV images of a dusty plasma (obtained after averaging 50 images) flow in a horizontal plane at different vertical locations of confined dust grains in a potential well. (a) Topmost dust grains (b) 2mm below the topmost dust grains plane, (c) 4mm lower than the topmost dust grains plane, (d) 6mm lower than the topmost dust grains plane. Fig. 5 of the paper by Mangilal Choudhary. https://doi.org/10.1002/ctpp.202300072

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来源期刊

Contributions to Plasma Physics 物理-物理：流体与等离子体

CiteScore

2.90

自引率

12.50%

发文量

110

审稿时长

4-8 weeks

期刊介绍： Aims and Scope of Contributions to Plasma Physics: Basic physics of low-temperature plasmas; Strongly correlated non-ideal plasmas; Dusty Plasmas; Plasma discharges - microplasmas, reactive, and atmospheric pressure plasmas; Plasma diagnostics; Plasma-surface interaction; Plasma technology; Plasma medicine.