封底内页:了解等离子蚀刻处理对氧还原反应催化剂的改进机理(EXP2 1/2024)

Peng Rao, Yanhui Yu, Shaolei Wang, Yu Zhou, Xiao Wu, Ke Li, Anyuan Qi, Peilin Deng, Yonggang Cheng, Jing Li, Zhengpei Miao, Xinlong Tian
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引用次数: 0

摘要

等离子刻蚀是合成电催化剂并改变其性能的一种有效策略。本研究揭示了等离子刻蚀法提高电催化剂活性的机理。氮等离子刻蚀处理引入的高活性金属氮物种被认为是提高电催化活性的主要原因,同时等离子刻蚀诱导的缺陷也有助于提高电催化活性。
本文章由计算机程序翻译,如有差异,请以英文原文为准。

Inside Back Cover: Understanding the improvement mechanism of plasma etching treatment on oxygen reduction reaction catalysts (EXP2 1/2024)

Inside Back Cover: Understanding the improvement mechanism of plasma etching treatment on oxygen reduction reaction catalysts (EXP2 1/2024)

Plasma etching is an effective strategy to synthesize the electrocatalysts, and modify its performance. In this work, the activity improvement mechanism of electrocatalysts by plasma etching is revealed. The highly active metal-nitrogen species introduced by nitrogen plasma etching treatment are recognized as the main contribution to the improved electrocatalytic activity, and simultaneously the defects induced by plasma etching also contribute to the high performance.

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