国家点火装置(NIF)最终光学器件二氧化硅出口表面损伤增长概率研究

Laser Damage Pub Date : 2023-11-24 DOI:10.1117/12.2688143
Christopher F. Miller, Ryan M. Gini, C. W. Carr
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引用次数: 0

摘要

二氧化硅光学器件的表面损伤通常会限制高能激光系统的运行。初始损伤会随着激光脉冲的增加而扩大,最终需要拆卸/更换光学器件。然而,当损伤首次出现时,小的损伤点会以随机的方式增长,而损伤点的大小、停留的表面以及后续激光照射的流率和脉冲持续时间都是很容易确定的参数。美国国家点火装置(NIF)在每次全系统点火时都会将约 100 平方米的熔融石英光学表面暴露在高能纳秒激光下,这为研究激光诱导损伤的生长行为提供了一个理想的平台。对单个损伤点进行高分辨率显微镜观察是标准 NIF 循环的一部分。然而,并不是所有的损伤点都能得到修复,这取决于主光学器件的使用年限和质量,因此成千上万个 50 微米以下的损伤点在成像后会重新生长。通过在每次拆卸光学器件进行回收时对这些损伤点进行测量,就可以在 NIF 激光器上对数千个损伤点进行照射前后的高分辨率显微镜观察。利用这种观测到的生长情况,对多脉冲描述进行了拟合,以预测在 3ω、纳秒级脉冲照射下,1-100 次激光照射时,出口表面损伤点生长的可能性。这为准确预测回收光学器件何时需要额外修复提供了依据。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Study of the probability of growth of silica exit surface damage on the National Ignition Facility (NIF) final optics
Surface damage of silica optics routinely limits the operation of high energy laser systems. Initiated damage can grow upon additional laser pulses, eventually requiring optic removal/replacement. However, when damage is first initiated, small damage sites grow in a stochastic manner, readily parameterized by the size of the damage site, surface of residence, and the fluence and pulse duration of subsequent laser exposures. The National Ignition Facility (NIF), which exposes ~100 m2 of fused silica optics surface to high-energy-nanosecond-laser light on every full system shot, provides an ideal platform to study the growth behavior of laser-induced damage. High-resolution microscopy of individual damage sites is captured as part of the standard NIF recycling loop. However, not all damage sites are repaired depending on the age and quality of the host optic leaving many thousands sub-50-micron damages sites to resume growth after being imaged. By measuring such sites each time an optic is removed for recycling, high-resolution microscopy becomes available for many thousands of sites before and after exposure to various shot sequences on the NIF laser. Using this observed growth, a multi-shot description was fit to predict the likelihood of exit surface damage site growth under exposure from 3ω, nanosecond regime pulses for shot sequence lengths between 1-100 laser exposures. This provides a basis for accurately predicting when a recycled optic will require additional repair.
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