无催化剂热化学气相沉积法一步快速生长氮掺杂石墨烯纳米壁

IF 2.1 4区材料科学 Q3 CHEMISTRY, PHYSICAL

Fullerenes, Nanotubes and Carbon Nanostructures Pub Date : 2023-11-20 DOI:10.1080/1536383x.2023.2282098

Thanattha Chobsilp, Thotsaphon Threrujirapapong, Visittapong Yordsri, Tuksadon Wutikhun, Alongkot Treetong, Worawut Muangrat

引用次数: 0

摘要

本文报道了一种利用热化学气相沉积(TCVD)在无催化剂基体上生长石墨烯纳米墙(GNWs)和氮掺杂石墨烯纳米墙(N-GNWs)的有效技术。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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One-step facile growth of nitrogen-doped graphene nanowalls by catalyst-free thermal chemical vapor deposition

We report an effective technique for the growth of graphene nanowalls (GNWs) and nitrogen-doped graphene nanowalls (N-GNWs) using a thermal chemical vapor deposition (TCVD) on the catalyst-free sub...

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来源期刊

Fullerenes, Nanotubes and Carbon Nanostructures 工程技术-材料科学：综合

CiteScore

4.80

自引率

17.40%

发文量

审稿时长

1 months

期刊介绍： The international and interdisciplinary forum, Fullerenes, Nanotubes, and Carbon Nanostructures , aims at publishing peer-reviewed research of original work in all areas of CARBON research including fullerenes, nanotubes, nanodiamond, graphene, any type of carbon nanostructure and any work dealing with carbon and carbon-related topics. Publishing high quality papers from all fields of carbon science and related topics, the journal intends to provide a means of communication between researchers who are interested in fundamental and applied carbon science issues.