通过控制电偶腐蚀,采用化学机械抛光法制备了超光滑的TaW合金表面

IF 2.4 4区 工程技术 Q3 ELECTROCHEMISTRY
Qijian Zhao, Chuandong Tian, Jiaxin Zheng, Pengfei Sun, Liang Jiang, Linmao Qian
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Preparing an ultra-smooth TaW alloy surface with chemical mechanical polishing via controlling galvanic corrosion
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来源期刊
Journal of Applied Electrochemistry
Journal of Applied Electrochemistry 工程技术-电化学
CiteScore
4.70
自引率
3.40%
发文量
133
审稿时长
2.9 months
期刊介绍: The Journal of Applied Electrochemistry is the leading journal on technologically orientated aspects of electrochemistry. The interface between electrochemical science and engineering is highlighted, emphasizing the application of electrochemistry to technological development and practice, and documenting properties and data of materials; design factors, design methodologies, scale-up, economics and testing of electrochemical devices and processes. The broad range of technologies includes energy conversion, conservation, and storage, new battery systems, fuel cells, super capacitors, solar cells, power delivery, industrial synthesis, environmental remediation, cell design, corrosion, electrochemical reaction engineering, medical applications of electrochemistry and bio-electrochemistry, the electrochemical treatment of effluents, hydrometallurgy, molten salt and solid state electrochemistry, surface finishing, electroplating, electrodeposition, sensors, and applications of molecular electrochemistry. It also publishes invited reviewed articles, book reviews and news items and a comprehensive electrochemical events calendar.
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