应用PVD技术开发电力系统用薄膜电容器

R. Radzuan, M. Salleh, M. K. Hamzah, H. Zulkefle, N. Sin, M. Rusop
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引用次数: 2

摘要

薄膜电容器是电解电容器的一个非常有趣的选择,因为它们简单,结构紧凑,并且有效地制造高频器件。薄膜涂层电容器也改善了加工特性和更好的介电强度。本文报道了在交直流变换器中用于直流滤波的薄膜电容器的研究进展。利用简单的仿真工具实现了高频交/直流变换器用薄膜电容器的设计。本文的主要研究假设是利用物理气相沉积(PVD)技术可以实现更小尺寸的高频电容。TiO2的厚度、金属接触面积和介电性能作为薄膜电容器开发的参数。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Development of thin film capacitors for power system applications by PVD technique
Thin film capacitors are very interesting option to electrolytic capacitors, because they are simple, compact in structure and effective for fabrication of high frequency devices. Thin film coating capacitors also improved processing characteristics and better dielectric strength. This paper reports the development of thin film capacitors for DC filtering in AC/DC converter application. The design of thin film capacitor for high frequency AC/DC converter is implemented using simple simulation tools. The primary research hypothesis is that high frequency capacitance with smaller size can be implemented using Physical Vapor Deposition, PVD technique. The thickness of TiO2, area of metal contact and dielectric properties of TiO2 are considered as parameters for thin film capacitors development.
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